Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates
Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined...
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| Format: | Article |
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| Language: | English |
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University of Tehran
2005-06-01
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| Series: | Journal of Sciences, Islamic Republic of Iran |
| Online Access: | https://jsciences.ut.ac.ir/article_31648_f59d8b255c25f83e4076465fea8aec42.pdf |
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| collection | DOAJ |
| description | Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet to middle infrared (140 nm-35 ?m). Also the surface roughnesses were measured by atomic force microscopy (AFM). |
| format | Article |
| id | doaj-art-b624b826d3ab4dafa773b3b2fcf4859b |
| institution | OA Journals |
| issn | 1016-1104 2345-6914 |
| language | English |
| publishDate | 2005-06-01 |
| publisher | University of Tehran |
| record_format | Article |
| series | Journal of Sciences, Islamic Republic of Iran |
| spelling | doaj-art-b624b826d3ab4dafa773b3b2fcf4859b2025-08-20T02:25:51ZengUniversity of TehranJournal of Sciences, Islamic Republic of Iran1016-11042345-69142005-06-0116231648Study of Iridium (Ir) Thin Films Deposited on to SiO2 SubstratesVery smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet to middle infrared (140 nm-35 ?m). Also the surface roughnesses were measured by atomic force microscopy (AFM).https://jsciences.ut.ac.ir/article_31648_f59d8b255c25f83e4076465fea8aec42.pdf |
| spellingShingle | Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates Journal of Sciences, Islamic Republic of Iran |
| title | Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates |
| title_full | Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates |
| title_fullStr | Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates |
| title_full_unstemmed | Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates |
| title_short | Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates |
| title_sort | study of iridium ir thin films deposited on to sio2 substrates |
| url | https://jsciences.ut.ac.ir/article_31648_f59d8b255c25f83e4076465fea8aec42.pdf |