Unveiling interfacial dead layer in wurtzite ferroelectrics

Abstract Wurtzite ferroelectrics hold immense promise to revolutionize modern micro- and nano-electronics due to their compatibility with semiconductor technologies. However, the presence of interfacial dead layers with irreversible polarization limits their development and applications, and the for...

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Main Authors: Jinlin Wang, Yun-Qin Li, Rui Wang, Qi Liu, Haotian Ye, Ping Wang, Xifan Xu, Huaiyuan Yang, Fang Liu, Bowen Sheng, Liuyun Yang, Xiaoyang Yin, Yi Tong, Tao Wang, Wen-Yi Tong, Xin-Zheng Li, Chun-Gang Duan, Bo Shen, Xinqiang Wang
Format: Article
Language:English
Published: Nature Portfolio 2025-07-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-025-61291-2
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author Jinlin Wang
Yun-Qin Li
Rui Wang
Qi Liu
Haotian Ye
Ping Wang
Xifan Xu
Huaiyuan Yang
Fang Liu
Bowen Sheng
Liuyun Yang
Xiaoyang Yin
Yi Tong
Tao Wang
Wen-Yi Tong
Xin-Zheng Li
Chun-Gang Duan
Bo Shen
Xinqiang Wang
author_facet Jinlin Wang
Yun-Qin Li
Rui Wang
Qi Liu
Haotian Ye
Ping Wang
Xifan Xu
Huaiyuan Yang
Fang Liu
Bowen Sheng
Liuyun Yang
Xiaoyang Yin
Yi Tong
Tao Wang
Wen-Yi Tong
Xin-Zheng Li
Chun-Gang Duan
Bo Shen
Xinqiang Wang
author_sort Jinlin Wang
collection DOAJ
description Abstract Wurtzite ferroelectrics hold immense promise to revolutionize modern micro- and nano-electronics due to their compatibility with semiconductor technologies. However, the presence of interfacial dead layers with irreversible polarization limits their development and applications, and the formation mechanisms of dead layers remain unclear. Here, we demonstrate that dead layer formation in ScAlN, a representative wurtzite ferroelectric, originates from a high density of nitrogen vacancies in combination with interfacial strain. Atomic-scale investigations using scanning transmission electron microscopy (STEM) and electron energy loss spectroscopy (EELS), supported by first-principles calculations, reveal that compressive strain near the ScAlN/GaN interface reduces the formation energy of nitrogen vacancies, promoting their generation. These vacancies degrade dielectric properties and raise the ferroelectric switching barrier, the latter further exacerbated by compressive strain. These combined effects suppress polarization reversibility near the interface. This work elucidates the microscopic origin of interfacial dead layers and highlights the significance of defect and strain engineering in wurtzite ferroelectrics, which are essential to advancing their integration and scalability in next-generation electronic devices.
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spelling doaj-art-b5bf1e36101649ec8e47b3f99db1bb682025-08-20T03:37:38ZengNature PortfolioNature Communications2041-17232025-07-0116111010.1038/s41467-025-61291-2Unveiling interfacial dead layer in wurtzite ferroelectricsJinlin Wang0Yun-Qin Li1Rui Wang2Qi Liu3Haotian Ye4Ping Wang5Xifan Xu6Huaiyuan Yang7Fang Liu8Bowen Sheng9Liuyun Yang10Xiaoyang Yin11Yi Tong12Tao Wang13Wen-Yi Tong14Xin-Zheng Li15Chun-Gang Duan16Bo Shen17Xinqiang Wang18State Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityKey Laboratory of Polar Materials and Devices (MOE), School of Physics and Electronic Science, East China Normal UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversitySuzhou LaboratoryState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityKey Laboratory of Polar Materials and Devices (MOE), School of Physics and Electronic Science, East China Normal UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityKey Laboratory of Polar Materials and Devices (MOE), School of Physics and Electronic Science, East China Normal UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityState Key Laboratory for Artificial Microstructure and Mesoscopic Physics, Frontier Science Center for Nano-optoelectronics and School of Physics, Peking UniversityAbstract Wurtzite ferroelectrics hold immense promise to revolutionize modern micro- and nano-electronics due to their compatibility with semiconductor technologies. However, the presence of interfacial dead layers with irreversible polarization limits their development and applications, and the formation mechanisms of dead layers remain unclear. Here, we demonstrate that dead layer formation in ScAlN, a representative wurtzite ferroelectric, originates from a high density of nitrogen vacancies in combination with interfacial strain. Atomic-scale investigations using scanning transmission electron microscopy (STEM) and electron energy loss spectroscopy (EELS), supported by first-principles calculations, reveal that compressive strain near the ScAlN/GaN interface reduces the formation energy of nitrogen vacancies, promoting their generation. These vacancies degrade dielectric properties and raise the ferroelectric switching barrier, the latter further exacerbated by compressive strain. These combined effects suppress polarization reversibility near the interface. This work elucidates the microscopic origin of interfacial dead layers and highlights the significance of defect and strain engineering in wurtzite ferroelectrics, which are essential to advancing their integration and scalability in next-generation electronic devices.https://doi.org/10.1038/s41467-025-61291-2
spellingShingle Jinlin Wang
Yun-Qin Li
Rui Wang
Qi Liu
Haotian Ye
Ping Wang
Xifan Xu
Huaiyuan Yang
Fang Liu
Bowen Sheng
Liuyun Yang
Xiaoyang Yin
Yi Tong
Tao Wang
Wen-Yi Tong
Xin-Zheng Li
Chun-Gang Duan
Bo Shen
Xinqiang Wang
Unveiling interfacial dead layer in wurtzite ferroelectrics
Nature Communications
title Unveiling interfacial dead layer in wurtzite ferroelectrics
title_full Unveiling interfacial dead layer in wurtzite ferroelectrics
title_fullStr Unveiling interfacial dead layer in wurtzite ferroelectrics
title_full_unstemmed Unveiling interfacial dead layer in wurtzite ferroelectrics
title_short Unveiling interfacial dead layer in wurtzite ferroelectrics
title_sort unveiling interfacial dead layer in wurtzite ferroelectrics
url https://doi.org/10.1038/s41467-025-61291-2
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