Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography
Microstructures are fabricated with a fast fabrication speed, submicron-scale precision and a minimum feature size of 1.5 μm. The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital mirror device (DMD) and photocurable res...
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| Main Authors: | Qi Zheng, Jinyun Zhou, Qiming Chen, Liang Lei, Kunhua Wen, Yiming Hu |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2019-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/8886475/ |
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