Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography

Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography

Microstructures are fabricated with a fast fabrication speed, submicron-scale precision and a minimum feature size of 1.5 μm. The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital mirror device (DMD) and photocurable res...

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Bibliographic Details
Main Authors: Qi Zheng, Jinyun Zhou, Qiming Chen, Liang Lei, Kunhua Wen, Yiming Hu
Format: Article
Language:English
Published: IEEE 2019-01-01
Series:IEEE Photonics Journal
Subjects:
Maskless lithography
rapid prototyping
micro-structure
binary optical element
Dammann grating.
Online Access:https://ieeexplore.ieee.org/document/8886475/
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