Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography
Microstructures are fabricated with a fast fabrication speed, submicron-scale precision and a minimum feature size of 1.5 μm. The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital mirror device (DMD) and photocurable res...
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| Format: | Article |
| Language: | English |
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IEEE
2019-01-01
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| Series: | IEEE Photonics Journal |
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| Online Access: | https://ieeexplore.ieee.org/document/8886475/ |
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| author | Qi Zheng Jinyun Zhou Qiming Chen Liang Lei Kunhua Wen Yiming Hu |
| author_facet | Qi Zheng Jinyun Zhou Qiming Chen Liang Lei Kunhua Wen Yiming Hu |
| author_sort | Qi Zheng |
| collection | DOAJ |
| description | Microstructures are fabricated with a fast fabrication speed, submicron-scale precision and a minimum feature size of 1.5 μm. The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital mirror device (DMD) and photocurable resin, which has a broad range of uses in three-dimensional (3D) printing. To illustrate the feasibility of this method, a Dammann grating is fabricated. Using a series of experiments and optimized designs, we analyze the characteristics of the photocurable resin, quantify the dose modulation for lithography and redesign the mask pattern. Consequently, a Dammann grating with a 50% diffraction efficiency is successfully fabricated, which can not only guarantee the precision but also maintain the fabrication speed. This work demonstrates the potential of this method to rapidly and directly manufacture binary optical elements or structures at the nanoscale based on photocurable resin and DMD-based maskless lithography. |
| format | Article |
| id | doaj-art-b52b5cbf2efa436fa6e9b0dc33d14004 |
| institution | OA Journals |
| issn | 1943-0655 |
| language | English |
| publishDate | 2019-01-01 |
| publisher | IEEE |
| record_format | Article |
| series | IEEE Photonics Journal |
| spelling | doaj-art-b52b5cbf2efa436fa6e9b0dc33d140042025-08-20T02:38:09ZengIEEEIEEE Photonics Journal1943-06552019-01-0111611010.1109/JPHOT.2019.29502818886475Rapid Prototyping of a Dammann Grating in DMD-Based Maskless LithographyQi Zheng0https://orcid.org/0000-0001-9578-5776Jinyun Zhou1Qiming Chen2Liang Lei3Kunhua Wen4https://orcid.org/0000-0002-7658-8731Yiming Hu5School of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou, ChinaSchool of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou, ChinaSchool of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou, ChinaSchool of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou, ChinaSchool of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou, ChinaSchool of Physics and Optoelectronic Engineering, Guangdong University of Technology, Guangzhou, ChinaMicrostructures are fabricated with a fast fabrication speed, submicron-scale precision and a minimum feature size of 1.5 μm. The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital mirror device (DMD) and photocurable resin, which has a broad range of uses in three-dimensional (3D) printing. To illustrate the feasibility of this method, a Dammann grating is fabricated. Using a series of experiments and optimized designs, we analyze the characteristics of the photocurable resin, quantify the dose modulation for lithography and redesign the mask pattern. Consequently, a Dammann grating with a 50% diffraction efficiency is successfully fabricated, which can not only guarantee the precision but also maintain the fabrication speed. This work demonstrates the potential of this method to rapidly and directly manufacture binary optical elements or structures at the nanoscale based on photocurable resin and DMD-based maskless lithography.https://ieeexplore.ieee.org/document/8886475/Maskless lithographyrapid prototypingmicro-structurebinary optical elementDammann grating. |
| spellingShingle | Qi Zheng Jinyun Zhou Qiming Chen Liang Lei Kunhua Wen Yiming Hu Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography IEEE Photonics Journal Maskless lithography rapid prototyping micro-structure binary optical element Dammann grating. |
| title | Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography |
| title_full | Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography |
| title_fullStr | Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography |
| title_full_unstemmed | Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography |
| title_short | Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography |
| title_sort | rapid prototyping of a dammann grating in dmd based maskless lithography |
| topic | Maskless lithography rapid prototyping micro-structure binary optical element Dammann grating. |
| url | https://ieeexplore.ieee.org/document/8886475/ |
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