Low-cost replication of self-organized sub-micron structures into polymer films
In this paper, the results of exploiting self-organized sub-micron polystyrene (PS) wrinkle patterns possessing random orientation, in preparation of a nickel stamp for hot embossing purposes, are presented. Self-organized patterns were prepared employing a method in which a stiff cross-linked cappi...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Budapest University of Technology and Economics
2015-02-01
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| Series: | eXPRESS Polymer Letters |
| Subjects: | |
| Online Access: | http://www.expresspolymlett.com/letolt.php?file=EPL-0005458&mi=cd |
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| Summary: | In this paper, the results of exploiting self-organized sub-micron polystyrene (PS) wrinkle patterns possessing random orientation, in preparation of a nickel stamp for hot embossing purposes, are presented. Self-organized patterns were prepared employing a method in which a stiff cross-linked capping layer on the topmost part of the soft polystyrene layer was created by using reactive ion etching (RIE) device with mild conditions and argon as a process gas, and the wrinkle formation was initiated thermally. Different surface patternings were obtained using silicon and stainless steel (SST) wafers as substrates. Prepared Ni-stamps were employed in hot embossing of polycarbonate (PC) and cyclo-olefin polymer (COP) films, using a nano-imprinting process. The replication quality of the self-organized wrinkle structures in PC and COP films was monitored by comparing the shape and dimensions of the original and final surface structures. The hot embossed sub-micron scale features, originally formed on stainless steel substrate, were found to have influence on the optical properties of the PC and COP films by lowering their reflectances. |
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| ISSN: | 1788-618X |