Size Effect of Negative Capacitance State and Subthreshold Swing in Van der Waals Ferrielectric Field‐Effect Transistors

Abstract Analytical calculations corroborated by the finite element modeling show that thin films of Van der Waals ferrielectrics covered by a 2D‐semiconductor are promising candidates for the controllable reduction of the dielectric layer capacitance due to the negative capacitance (NC) effect emer...

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Main Authors: Anna N. Morozovska, Eugene A. Eliseev, Yulian M. Vysochanskii, Sergei V. Kalinin, Maksym V. Strikha
Format: Article
Language:English
Published: Wiley-VCH 2025-04-01
Series:Advanced Electronic Materials
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Online Access:https://doi.org/10.1002/aelm.202400495
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author Anna N. Morozovska
Eugene A. Eliseev
Yulian M. Vysochanskii
Sergei V. Kalinin
Maksym V. Strikha
author_facet Anna N. Morozovska
Eugene A. Eliseev
Yulian M. Vysochanskii
Sergei V. Kalinin
Maksym V. Strikha
author_sort Anna N. Morozovska
collection DOAJ
description Abstract Analytical calculations corroborated by the finite element modeling show that thin films of Van der Waals ferrielectrics covered by a 2D‐semiconductor are promising candidates for the controllable reduction of the dielectric layer capacitance due to the negative capacitance (NC) effect emerging in the thin films. The NC state is conditioned by energy‐degenerated poly‐domain states of the ferrielectric polarization induced in the films under incomplete screening conditions in the presence of a dielectric layer. Calculations performed for the FET‐type heterostructure “ferrielectric CuInP2S6 film—2D‐MoS2 single‐layer—SiO2 dielectric layer” reveal the pronounced size effect of the multilayer capacitance. Derived analytical expressions for the electric polarization and multilayer capacitance allow to predict the thickness range of the dielectric layer and ferrielectric film for which the NC effect is the most pronounced in various Van der Waals ferrielectrics, and the corresponding subthreshold swing becomes much less than the Boltzmann's limit. Obtained results can be useful for the size and temperature control of the NC effect in the steep‐slope ferrielectric FETs.
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issn 2199-160X
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series Advanced Electronic Materials
spelling doaj-art-af0f7339be26455ca1f85c8e0dd125f22025-08-20T03:06:43ZengWiley-VCHAdvanced Electronic Materials2199-160X2025-04-01114n/an/a10.1002/aelm.202400495Size Effect of Negative Capacitance State and Subthreshold Swing in Van der Waals Ferrielectric Field‐Effect TransistorsAnna N. Morozovska0Eugene A. Eliseev1Yulian M. Vysochanskii2Sergei V. Kalinin3Maksym V. Strikha4Institute of Physics National Academy of Sciences of Ukraine Pr. Nauky 46 Kyiv 03028 UkraineFrantsevich Institute for Problems in Materials Science National Academy of Sciences of Ukraine Str. Omeliana Pritsaka 3 Kyiv 03142 UkraineInstitute of Solid State Physics and Chemistry Uzhhorod University Uzhhorod 88000 UkraineDepartment of Materials Science and Engineering University of Tennessee Knoxville TN 37996 USATaras Shevchenko National University of Kyiv Faculty of Radiophysics Electronics and Computer Systems Pr. Akademika Hlushkova 4g Kyiv 03022 UkraineAbstract Analytical calculations corroborated by the finite element modeling show that thin films of Van der Waals ferrielectrics covered by a 2D‐semiconductor are promising candidates for the controllable reduction of the dielectric layer capacitance due to the negative capacitance (NC) effect emerging in the thin films. The NC state is conditioned by energy‐degenerated poly‐domain states of the ferrielectric polarization induced in the films under incomplete screening conditions in the presence of a dielectric layer. Calculations performed for the FET‐type heterostructure “ferrielectric CuInP2S6 film—2D‐MoS2 single‐layer—SiO2 dielectric layer” reveal the pronounced size effect of the multilayer capacitance. Derived analytical expressions for the electric polarization and multilayer capacitance allow to predict the thickness range of the dielectric layer and ferrielectric film for which the NC effect is the most pronounced in various Van der Waals ferrielectrics, and the corresponding subthreshold swing becomes much less than the Boltzmann's limit. Obtained results can be useful for the size and temperature control of the NC effect in the steep‐slope ferrielectric FETs.https://doi.org/10.1002/aelm.202400495field‐effect transistorsnegative capacitancevan der Waals ferrielectrics
spellingShingle Anna N. Morozovska
Eugene A. Eliseev
Yulian M. Vysochanskii
Sergei V. Kalinin
Maksym V. Strikha
Size Effect of Negative Capacitance State and Subthreshold Swing in Van der Waals Ferrielectric Field‐Effect Transistors
Advanced Electronic Materials
field‐effect transistors
negative capacitance
van der Waals ferrielectrics
title Size Effect of Negative Capacitance State and Subthreshold Swing in Van der Waals Ferrielectric Field‐Effect Transistors
title_full Size Effect of Negative Capacitance State and Subthreshold Swing in Van der Waals Ferrielectric Field‐Effect Transistors
title_fullStr Size Effect of Negative Capacitance State and Subthreshold Swing in Van der Waals Ferrielectric Field‐Effect Transistors
title_full_unstemmed Size Effect of Negative Capacitance State and Subthreshold Swing in Van der Waals Ferrielectric Field‐Effect Transistors
title_short Size Effect of Negative Capacitance State and Subthreshold Swing in Van der Waals Ferrielectric Field‐Effect Transistors
title_sort size effect of negative capacitance state and subthreshold swing in van der waals ferrielectric field effect transistors
topic field‐effect transistors
negative capacitance
van der Waals ferrielectrics
url https://doi.org/10.1002/aelm.202400495
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AT eugeneaeliseev sizeeffectofnegativecapacitancestateandsubthresholdswinginvanderwaalsferrielectricfieldeffecttransistors
AT yulianmvysochanskii sizeeffectofnegativecapacitancestateandsubthresholdswinginvanderwaalsferrielectricfieldeffecttransistors
AT sergeivkalinin sizeeffectofnegativecapacitancestateandsubthresholdswinginvanderwaalsferrielectricfieldeffecttransistors
AT maksymvstrikha sizeeffectofnegativecapacitancestateandsubthresholdswinginvanderwaalsferrielectricfieldeffecttransistors