Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology

Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology

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Bibliographic Details
Main Author:	International Journal of Photoenergy
Format:	Article
Language:	English
Published:	Wiley 2018-01-01
Series:	International Journal of Photoenergy
Online Access:	http://dx.doi.org/10.1155/2018/9315054
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