Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology

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Bibliographic Details
Main Author: International Journal of Photoenergy
Format: Article
Language:English
Published: Wiley 2018-01-01
Series:International Journal of Photoenergy
Online Access:http://dx.doi.org/10.1155/2018/9315054
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author International Journal of Photoenergy
author_facet International Journal of Photoenergy
author_sort International Journal of Photoenergy
collection DOAJ
format Article
id doaj-art-ad2dea6aba104e0a9e316700ff9bc1d4
institution Kabale University
issn 1110-662X
1687-529X
language English
publishDate 2018-01-01
publisher Wiley
record_format Article
series International Journal of Photoenergy
spelling doaj-art-ad2dea6aba104e0a9e316700ff9bc1d42025-02-03T05:46:34ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2018-01-01201810.1155/2018/93150549315054Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron TechnologyInternational Journal of Photoenergyhttp://dx.doi.org/10.1155/2018/9315054
spellingShingle International Journal of Photoenergy
Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology
International Journal of Photoenergy
title Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology
title_full Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology
title_fullStr Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology
title_full_unstemmed Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology
title_short Retracted: Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology
title_sort retracted radiation hardness of flash memory fabricated in deep submicron technology
url http://dx.doi.org/10.1155/2018/9315054
work_keys_str_mv AT internationaljournalofphotoenergy retractedradiationhardnessofflashmemoryfabricatedindeepsubmicrontechnology