Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type Nanowires
Plasmonic properties of rectangular core-shell type nanowires embedded in thin film silicon solar cell structure were characterized using FDTD simulations. Plasmon resonance of these nanowires showed tunability from nm. However this absorption was significantly smaller than the Ohmic loss in the si...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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Wiley
2014-01-01
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| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2014/249476 |
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| author | Mohammed Shahriar Sabuktagin Khairus Syifa Hamdan Khaulah Sulaiman Rozalina Zakaria Harith Ahmad |
| author_facet | Mohammed Shahriar Sabuktagin Khairus Syifa Hamdan Khaulah Sulaiman Rozalina Zakaria Harith Ahmad |
| author_sort | Mohammed Shahriar Sabuktagin |
| collection | DOAJ |
| description | Plasmonic properties of rectangular core-shell type nanowires embedded in thin film silicon solar cell structure were characterized using FDTD simulations. Plasmon resonance of these nanowires showed tunability from nm. However this absorption was significantly smaller than the Ohmic loss in the silver shell due to very low near-bandgap absorption properties of silicon. Prospect of improving enhanced absorption in silicon to Ohmic loss ratio by utilizing dual capability of these nanowires in boosting impurity photovoltaic effect and efficient extraction of the photogenerated carriers was discussed. Our results indicate that high volume fabrication capacity of optical lithography techniques can be utilized for plasmonic absorption enhancement in thin film silicon solar cells over the entire long wavelength range of solar radiation. |
| format | Article |
| id | doaj-art-aa3b3211171e4ef5b2ef33dc6ec22f0b |
| institution | Kabale University |
| issn | 1110-662X 1687-529X |
| language | English |
| publishDate | 2014-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Photoenergy |
| spelling | doaj-art-aa3b3211171e4ef5b2ef33dc6ec22f0b2025-02-03T01:10:29ZengWileyInternational Journal of Photoenergy1110-662X1687-529X2014-01-01201410.1155/2014/249476249476Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type NanowiresMohammed Shahriar Sabuktagin0Khairus Syifa Hamdan1Khaulah Sulaiman2Rozalina Zakaria3Harith Ahmad4Department of Physics, Faculty of Science, University of Malaya, 50603 Kuala Lumpur, MalaysiaDepartment of Physics, Faculty of Science, University of Malaya, 50603 Kuala Lumpur, MalaysiaDepartment of Physics, Faculty of Science, University of Malaya, 50603 Kuala Lumpur, MalaysiaPhotonics Research Center, University of Malaya, 50603 Kuala Lumpur, MalaysiaPhotonics Research Center, University of Malaya, 50603 Kuala Lumpur, MalaysiaPlasmonic properties of rectangular core-shell type nanowires embedded in thin film silicon solar cell structure were characterized using FDTD simulations. Plasmon resonance of these nanowires showed tunability from nm. However this absorption was significantly smaller than the Ohmic loss in the silver shell due to very low near-bandgap absorption properties of silicon. Prospect of improving enhanced absorption in silicon to Ohmic loss ratio by utilizing dual capability of these nanowires in boosting impurity photovoltaic effect and efficient extraction of the photogenerated carriers was discussed. Our results indicate that high volume fabrication capacity of optical lithography techniques can be utilized for plasmonic absorption enhancement in thin film silicon solar cells over the entire long wavelength range of solar radiation.http://dx.doi.org/10.1155/2014/249476 |
| spellingShingle | Mohammed Shahriar Sabuktagin Khairus Syifa Hamdan Khaulah Sulaiman Rozalina Zakaria Harith Ahmad Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type Nanowires International Journal of Photoenergy |
| title | Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type Nanowires |
| title_full | Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type Nanowires |
| title_fullStr | Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type Nanowires |
| title_full_unstemmed | Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type Nanowires |
| title_short | Long Wavelength Plasmonic Absorption Enhancement in Silicon Using Optical Lithography Compatible Core-Shell-Type Nanowires |
| title_sort | long wavelength plasmonic absorption enhancement in silicon using optical lithography compatible core shell type nanowires |
| url | http://dx.doi.org/10.1155/2014/249476 |
| work_keys_str_mv | AT mohammedshahriarsabuktagin longwavelengthplasmonicabsorptionenhancementinsiliconusingopticallithographycompatiblecoreshelltypenanowires AT khairussyifahamdan longwavelengthplasmonicabsorptionenhancementinsiliconusingopticallithographycompatiblecoreshelltypenanowires AT khaulahsulaiman longwavelengthplasmonicabsorptionenhancementinsiliconusingopticallithographycompatiblecoreshelltypenanowires AT rozalinazakaria longwavelengthplasmonicabsorptionenhancementinsiliconusingopticallithographycompatiblecoreshelltypenanowires AT harithahmad longwavelengthplasmonicabsorptionenhancementinsiliconusingopticallithographycompatiblecoreshelltypenanowires |