Photoreflectance and Raman Study of Surface Electric States on AlGaAs/GaAs Heterostructures

Photoreflectance (PR) and Raman are two very useful spectroscopy techniques that usually are used to know the surface electronic states in GaAs-based semiconductor devices. However, although they are exceptional tools there are few reports where both techniques were used in these kinds of devices. I...

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Main Authors: Luis Zamora-Peredo, Leandro García-González, Julián Hernández-Torres, Irving E. Cortes-Mestizo, Víctor H. Méndez-García, Máximo López-López
Format: Article
Language:English
Published: Wiley 2016-01-01
Series:Journal of Spectroscopy
Online Access:http://dx.doi.org/10.1155/2016/4601249
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author Luis Zamora-Peredo
Leandro García-González
Julián Hernández-Torres
Irving E. Cortes-Mestizo
Víctor H. Méndez-García
Máximo López-López
author_facet Luis Zamora-Peredo
Leandro García-González
Julián Hernández-Torres
Irving E. Cortes-Mestizo
Víctor H. Méndez-García
Máximo López-López
author_sort Luis Zamora-Peredo
collection DOAJ
description Photoreflectance (PR) and Raman are two very useful spectroscopy techniques that usually are used to know the surface electronic states in GaAs-based semiconductor devices. However, although they are exceptional tools there are few reports where both techniques were used in these kinds of devices. In this work, the surface electronic states on AlGaAs/GaAs heterostructures were studied in order to identify the effect of factors like laser penetration depth, cap layer thickness, and surface passivation over PR and Raman spectra. PR measurements were performed alternately with two lasers (532 nm and 375 nm wavelength) as the modulation sources in order to identify internal and surface features. The surface electric field calculated by PR analysis decreased whereas the GaAs cap layer thickness increased, in good agreement with a similar behavior observed in Raman measurements (IL-/ILO ratio). When the heterostructures were treated by Si-flux, these techniques showed contrary behaviors. PR analysis revealed a diminution in the surface electric field due to a passivation process whereas the IL-/ILO ratio did not present the same behavior because it was dominated by the depletion layers width (cap layer thickness) and the laser penetration depth.
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spelling doaj-art-a98cd3034b8c414faf99be39f96e68e62025-08-20T02:23:06ZengWileyJournal of Spectroscopy2314-49202314-49392016-01-01201610.1155/2016/46012494601249Photoreflectance and Raman Study of Surface Electric States on AlGaAs/GaAs HeterostructuresLuis Zamora-Peredo0Leandro García-González1Julián Hernández-Torres2Irving E. Cortes-Mestizo3Víctor H. Méndez-García4Máximo López-López5Centro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Calzada Adolfo Ruiz Cortines 455, Fracc. Costa Verde, 94292 Boca del Río, VER, MexicoCentro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Calzada Adolfo Ruiz Cortines 455, Fracc. Costa Verde, 94292 Boca del Río, VER, MexicoCentro de Investigación en Micro y Nanotecnología, Universidad Veracruzana, Calzada Adolfo Ruiz Cortines 455, Fracc. Costa Verde, 94292 Boca del Río, VER, MexicoUniversidad Autónoma de San Luis Potosí, Center for the Innovation and Application of Science and Technology, Sierra Leona 550, Lomas 4a Secc., 78210 San Luis Potosí, SLP, MexicoUniversidad Autónoma de San Luis Potosí, Center for the Innovation and Application of Science and Technology, Sierra Leona 550, Lomas 4a Secc., 78210 San Luis Potosí, SLP, MexicoCentro de Investigación y Estudios Avanzados del IPN, Apartado Postal 14-740, 07360 Ciudad de México, MexicoPhotoreflectance (PR) and Raman are two very useful spectroscopy techniques that usually are used to know the surface electronic states in GaAs-based semiconductor devices. However, although they are exceptional tools there are few reports where both techniques were used in these kinds of devices. In this work, the surface electronic states on AlGaAs/GaAs heterostructures were studied in order to identify the effect of factors like laser penetration depth, cap layer thickness, and surface passivation over PR and Raman spectra. PR measurements were performed alternately with two lasers (532 nm and 375 nm wavelength) as the modulation sources in order to identify internal and surface features. The surface electric field calculated by PR analysis decreased whereas the GaAs cap layer thickness increased, in good agreement with a similar behavior observed in Raman measurements (IL-/ILO ratio). When the heterostructures were treated by Si-flux, these techniques showed contrary behaviors. PR analysis revealed a diminution in the surface electric field due to a passivation process whereas the IL-/ILO ratio did not present the same behavior because it was dominated by the depletion layers width (cap layer thickness) and the laser penetration depth.http://dx.doi.org/10.1155/2016/4601249
spellingShingle Luis Zamora-Peredo
Leandro García-González
Julián Hernández-Torres
Irving E. Cortes-Mestizo
Víctor H. Méndez-García
Máximo López-López
Photoreflectance and Raman Study of Surface Electric States on AlGaAs/GaAs Heterostructures
Journal of Spectroscopy
title Photoreflectance and Raman Study of Surface Electric States on AlGaAs/GaAs Heterostructures
title_full Photoreflectance and Raman Study of Surface Electric States on AlGaAs/GaAs Heterostructures
title_fullStr Photoreflectance and Raman Study of Surface Electric States on AlGaAs/GaAs Heterostructures
title_full_unstemmed Photoreflectance and Raman Study of Surface Electric States on AlGaAs/GaAs Heterostructures
title_short Photoreflectance and Raman Study of Surface Electric States on AlGaAs/GaAs Heterostructures
title_sort photoreflectance and raman study of surface electric states on algaas gaas heterostructures
url http://dx.doi.org/10.1155/2016/4601249
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