Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System

Single wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm. The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were...

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Main Authors: Avshish Kumar, Shama Parveen, Samina Husain, Javid Ali, Harsh, M. Husain
Format: Article
Language:English
Published: Sumy State University 2013-05-01
Series:Журнал нано- та електронної фізики
Subjects:
Online Access:http://jnep.sumdu.edu.ua/download/numbers/2013/2/articles/jnep_2013_V5_02012.pdf
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author Avshish Kumar
Shama Parveen
Samina Husain
Javid Ali
Harsh
M. Husain
author_facet Avshish Kumar
Shama Parveen
Samina Husain
Javid Ali
Harsh
M. Husain
author_sort Avshish Kumar
collection DOAJ
description Single wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm. The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were characterized by various techniques such as SEM, Raman study etc.
format Article
id doaj-art-a7f4e126c69e4145b4ab463a72d589da
institution Kabale University
issn 2077-6772
language English
publishDate 2013-05-01
publisher Sumy State University
record_format Article
series Журнал нано- та електронної фізики
spelling doaj-art-a7f4e126c69e4145b4ab463a72d589da2025-08-20T03:38:53ZengSumy State UniversityЖурнал нано- та електронної фізики2077-67722013-05-0152020121Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) SystemAvshish KumarShama ParveenSamina HusainJavid AliHarshM. HusainSingle wall carbon nanotubes have been grown on Fe using Plasma Enhanced Chemical Vapour Deposition (PECVD) system. The thickness of the Fe film prepared by RF sputtering system was about 10 nm. The field emission characteristic was measured which showed good enhancement factor. The grown CNTs were characterized by various techniques such as SEM, Raman study etc.http://jnep.sumdu.edu.ua/download/numbers/2013/2/articles/jnep_2013_V5_02012.pdfCarbon nanotubesPECVDRF sputteringField emissionScanning electron microscopyRama
spellingShingle Avshish Kumar
Shama Parveen
Samina Husain
Javid Ali
Harsh
M. Husain
Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
Журнал нано- та електронної фізики
Carbon nanotubes
PECVD
RF sputtering
Field emission
Scanning electron microscopy
Rama
title Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
title_full Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
title_fullStr Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
title_full_unstemmed Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
title_short Field Emission Behaviour of the Single Wall Carbon Nanotubes Grown by Plasma Enhanced Chemical Vapour Deposition (PECVD) System
title_sort field emission behaviour of the single wall carbon nanotubes grown by plasma enhanced chemical vapour deposition pecvd system
topic Carbon nanotubes
PECVD
RF sputtering
Field emission
Scanning electron microscopy
Rama
url http://jnep.sumdu.edu.ua/download/numbers/2013/2/articles/jnep_2013_V5_02012.pdf
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