Investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptions

Abstract In this paper, we examine the effects of subband quantization on the efficacy of an L-shaped gate vertical dopingless tunneling field-effect transistor. The proposed architecture leverages an intrinsic tunneling interface that is fully aligned with the gate metal, resulting in enhanced elec...

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Main Authors: Iman Chahardah Cherik, Saeed Mohammadi, Paul K. Hurley, Lida Ansari, Farzan Gity
Format: Article
Language:English
Published: Nature Portfolio 2025-02-01
Series:Scientific Reports
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Online Access:https://doi.org/10.1038/s41598-025-88281-0
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author Iman Chahardah Cherik
Saeed Mohammadi
Paul K. Hurley
Lida Ansari
Farzan Gity
author_facet Iman Chahardah Cherik
Saeed Mohammadi
Paul K. Hurley
Lida Ansari
Farzan Gity
author_sort Iman Chahardah Cherik
collection DOAJ
description Abstract In this paper, we examine the effects of subband quantization on the efficacy of an L-shaped gate vertical dopingless tunneling field-effect transistor. The proposed architecture leverages an intrinsic tunneling interface that is fully aligned with the gate metal, resulting in enhanced electrostatic control. We utilized a two-step numerical simulation approach grounded in the Schrödinger-Poisson equations to evaluate the performance of our proposed device and accurately calculate the ON-state current. Additionally, we assessed the influence of defects at the heterojunction on the performance of our device. Under quantum mechanical assumptions, parameters such as I ON = 23.8 µA/µm, SS AVG = 12.03 mV/dec, and the I ON/I OFF ratio = 4.88 × 1010 indicate that our structure is a promising candidate for high-performance applications.
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institution Kabale University
issn 2045-2322
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publishDate 2025-02-01
publisher Nature Portfolio
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series Scientific Reports
spelling doaj-art-a6e586e1e3be448e916e27bb26df1eba2025-02-09T12:34:49ZengNature PortfolioScientific Reports2045-23222025-02-011511710.1038/s41598-025-88281-0Investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptionsIman Chahardah Cherik0Saeed Mohammadi1Paul K. Hurley2Lida Ansari3Farzan Gity4Department of Electrical and Computer Engineering, Semnan UniversityDepartment of Electrical and Computer Engineering, Semnan UniversityMicroNano Systems Centre, Tyndall National Institute, University College CorkMicroNano Systems Centre, Tyndall National Institute, University College CorkMicroNano Systems Centre, Tyndall National Institute, University College CorkAbstract In this paper, we examine the effects of subband quantization on the efficacy of an L-shaped gate vertical dopingless tunneling field-effect transistor. The proposed architecture leverages an intrinsic tunneling interface that is fully aligned with the gate metal, resulting in enhanced electrostatic control. We utilized a two-step numerical simulation approach grounded in the Schrödinger-Poisson equations to evaluate the performance of our proposed device and accurately calculate the ON-state current. Additionally, we assessed the influence of defects at the heterojunction on the performance of our device. Under quantum mechanical assumptions, parameters such as I ON = 23.8 µA/µm, SS AVG = 12.03 mV/dec, and the I ON/I OFF ratio = 4.88 × 1010 indicate that our structure is a promising candidate for high-performance applications.https://doi.org/10.1038/s41598-025-88281-0TFETDopinglessQuantum confinementTrap-assisted tunnelingHeterojunction
spellingShingle Iman Chahardah Cherik
Saeed Mohammadi
Paul K. Hurley
Lida Ansari
Farzan Gity
Investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptions
Scientific Reports
TFET
Dopingless
Quantum confinement
Trap-assisted tunneling
Heterojunction
title Investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptions
title_full Investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptions
title_fullStr Investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptions
title_full_unstemmed Investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptions
title_short Investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptions
title_sort investigating vertical charge plasma tunnel field effect transistors beyond semiclassical assumptions
topic TFET
Dopingless
Quantum confinement
Trap-assisted tunneling
Heterojunction
url https://doi.org/10.1038/s41598-025-88281-0
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AT paulkhurley investigatingverticalchargeplasmatunnelfieldeffecttransistorsbeyondsemiclassicalassumptions
AT lidaansari investigatingverticalchargeplasmatunnelfieldeffecttransistorsbeyondsemiclassicalassumptions
AT farzangity investigatingverticalchargeplasmatunnelfieldeffecttransistorsbeyondsemiclassicalassumptions