Gorbachuk, N. I., Poklonski, N. A., Marochkina, Y. N., & Shpakovski, S. V. Effect of Hole Extraction from the Base Region of a Silicon <i>p–n–p</i> Transistor on its Reactive Impedance. Belarusian National Technical University.
Chicago Style (17th ed.) CitationGorbachuk, N. I., N. A. Poklonski, Ya. N. Marochkina, and S. V. Shpakovski. Effect of Hole Extraction from the Base Region of a Silicon <i>p–n–p</i> Transistor on Its Reactive Impedance. Belarusian National Technical University.
MLA (9th ed.) CitationGorbachuk, N. I., et al. Effect of Hole Extraction from the Base Region of a Silicon <i>p–n–p</i> Transistor on Its Reactive Impedance. Belarusian National Technical University.
Warning: These citations may not always be 100% accurate.