A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and Applications
This study offers a comprehensive summary of the current states as well as potential future directions of transparent conducting oxides (TCOs), particularly tin-doped indium oxide (ITO), the most readily accessible TCO on the market. Solar cells, flat panel displays (FPDs), liquid crystal displays (...
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MDPI AG
2024-12-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/14/24/2013 |
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| author | Jessica Patel Razia Khan Sharme Manuel A. Quijada Mukti M. Rana |
| author_facet | Jessica Patel Razia Khan Sharme Manuel A. Quijada Mukti M. Rana |
| author_sort | Jessica Patel |
| collection | DOAJ |
| description | This study offers a comprehensive summary of the current states as well as potential future directions of transparent conducting oxides (TCOs), particularly tin-doped indium oxide (ITO), the most readily accessible TCO on the market. Solar cells, flat panel displays (FPDs), liquid crystal displays (LCDs), antireflection (AR) coatings for airbus windows, photovoltaic and optoelectronic devices, transparent p–n junction diodes, etc. are a few of the best uses for this material. Other conductive metals that show a lot of promise as substitutes for traditional conductive materials include copper, zinc oxide, aluminum, silver, gold, and tin. These metals are also utilized in AR coatings. The optimal deposition techniques for creating ITO films under the current conditions have been determined to be DC (direct current) and RF (radio frequency) MS (magnetron sputtering) deposition, both with and without the introduction of Ar gas. When producing most types of AR coatings, it is necessary to obtain thicknesses of at least 100 nm and minimum resistivities on the order of 10<sup>−4</sup> Ω cm. For AR coatings, issues related to less-conductive materials than ITO have been considered. |
| format | Article |
| id | doaj-art-a4ae63bcf7c44d84aee45c1a5e2a50fe |
| institution | OA Journals |
| issn | 2079-4991 |
| language | English |
| publishDate | 2024-12-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Nanomaterials |
| spelling | doaj-art-a4ae63bcf7c44d84aee45c1a5e2a50fe2025-08-20T02:01:10ZengMDPI AGNanomaterials2079-49912024-12-011424201310.3390/nano14242013A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and ApplicationsJessica Patel0Razia Khan Sharme1Manuel A. Quijada2Mukti M. Rana3Division of Physics, Engineering, Mathematics and Computer Sciences and Optical Science Center for Applied Research, Delaware State University, Dover, DE 19901, USADivision of Physics, Engineering, Mathematics and Computer Sciences and Optical Science Center for Applied Research, Delaware State University, Dover, DE 19901, USANASA Goddard Space Flight Center, Greenbelt, MD 20771, USADivision of Physics, Engineering, Mathematics and Computer Sciences and Optical Science Center for Applied Research, Delaware State University, Dover, DE 19901, USAThis study offers a comprehensive summary of the current states as well as potential future directions of transparent conducting oxides (TCOs), particularly tin-doped indium oxide (ITO), the most readily accessible TCO on the market. Solar cells, flat panel displays (FPDs), liquid crystal displays (LCDs), antireflection (AR) coatings for airbus windows, photovoltaic and optoelectronic devices, transparent p–n junction diodes, etc. are a few of the best uses for this material. Other conductive metals that show a lot of promise as substitutes for traditional conductive materials include copper, zinc oxide, aluminum, silver, gold, and tin. These metals are also utilized in AR coatings. The optimal deposition techniques for creating ITO films under the current conditions have been determined to be DC (direct current) and RF (radio frequency) MS (magnetron sputtering) deposition, both with and without the introduction of Ar gas. When producing most types of AR coatings, it is necessary to obtain thicknesses of at least 100 nm and minimum resistivities on the order of 10<sup>−4</sup> Ω cm. For AR coatings, issues related to less-conductive materials than ITO have been considered.https://www.mdpi.com/2079-4991/14/24/2013TCOthin filmITOantireflectiontransparent electrodetransparent conducting film |
| spellingShingle | Jessica Patel Razia Khan Sharme Manuel A. Quijada Mukti M. Rana A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and Applications Nanomaterials TCO thin film ITO antireflection transparent electrode transparent conducting film |
| title | A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and Applications |
| title_full | A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and Applications |
| title_fullStr | A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and Applications |
| title_full_unstemmed | A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and Applications |
| title_short | A Review of Transparent Conducting Films (TCFs): Prospective ITO and AZO Deposition Methods and Applications |
| title_sort | review of transparent conducting films tcfs prospective ito and azo deposition methods and applications |
| topic | TCO thin film ITO antireflection transparent electrode transparent conducting film |
| url | https://www.mdpi.com/2079-4991/14/24/2013 |
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