LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS

Radiation enhanced diffusion at the surface of metals has been observed and studied for low-energy nitrogen ions at the surface of copper. The displacement of the target atoms during irradiation creates vacancies and other defects near the surface, thus enhancing the diffusion of implanted materials...

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Format: Article
Language:English
Published: University of Tehran 1996-12-01
Series:Journal of Sciences, Islamic Republic of Iran
Online Access:https://jsciences.ut.ac.ir/article_31139_93c1f29dc7c2fbe119e971f3f300c3be.pdf
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collection DOAJ
description Radiation enhanced diffusion at the surface of metals has been observed and studied for low-energy nitrogen ions at the surface of copper. The displacement of the target atoms during irradiation creates vacancies and other defects near the surface, thus enhancing the diffusion of implanted materials toward the surface and also into the solid. The mechanism has been studied here by a special method. An overcoat layer has been evaporated on the surface of the thin film sample following the implantation and the defects have been produced in the overcoat layer by another ion. The original implanted ions are observed to diffuse to the new surface through the open channels created by the auxiliary ions. The effect of this diffusion on the range distributions of low-energy ions in copper has also been discussed
format Article
id doaj-art-a39c74db192a466ea61b8e04656a556a
institution DOAJ
issn 1016-1104
2345-6914
language English
publishDate 1996-12-01
publisher University of Tehran
record_format Article
series Journal of Sciences, Islamic Republic of Iran
spelling doaj-art-a39c74db192a466ea61b8e04656a556a2025-08-20T03:08:48ZengUniversity of TehranJournal of Sciences, Islamic Republic of Iran1016-11042345-69141996-12-017431139LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALSRadiation enhanced diffusion at the surface of metals has been observed and studied for low-energy nitrogen ions at the surface of copper. The displacement of the target atoms during irradiation creates vacancies and other defects near the surface, thus enhancing the diffusion of implanted materials toward the surface and also into the solid. The mechanism has been studied here by a special method. An overcoat layer has been evaporated on the surface of the thin film sample following the implantation and the defects have been produced in the overcoat layer by another ion. The original implanted ions are observed to diffuse to the new surface through the open channels created by the auxiliary ions. The effect of this diffusion on the range distributions of low-energy ions in copper has also been discussedhttps://jsciences.ut.ac.ir/article_31139_93c1f29dc7c2fbe119e971f3f300c3be.pdf
spellingShingle LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
Journal of Sciences, Islamic Republic of Iran
title LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
title_full LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
title_fullStr LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
title_full_unstemmed LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
title_short LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS
title_sort low energy ion enhanced diffusion at the surface of metals
url https://jsciences.ut.ac.ir/article_31139_93c1f29dc7c2fbe119e971f3f300c3be.pdf