Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering
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| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
1981-01-01
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| Series: | Active and Passive Electronic Components |
| Online Access: | http://dx.doi.org/10.1155/APEC.8.249 |
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| _version_ | 1850170240844955648 |
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| author | T. Muto K. Kawabata |
| author_facet | T. Muto K. Kawabata |
| author_sort | T. Muto |
| collection | DOAJ |
| format | Article |
| id | doaj-art-a33fdbb0ed6f4614b320dff4786de6b9 |
| institution | OA Journals |
| issn | 0882-7516 1563-5031 |
| language | English |
| publishDate | 1981-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Active and Passive Electronic Components |
| spelling | doaj-art-a33fdbb0ed6f4614b320dff4786de6b92025-08-20T02:20:32ZengWileyActive and Passive Electronic Components0882-75161563-50311981-01-0183-424924910.1155/APEC.8.249Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive SputteringT. MutoK. Kawabatahttp://dx.doi.org/10.1155/APEC.8.249 |
| spellingShingle | T. Muto K. Kawabata Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering Active and Passive Electronic Components |
| title | Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering |
| title_full | Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering |
| title_fullStr | Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering |
| title_full_unstemmed | Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering |
| title_short | Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering |
| title_sort | electrical properties of titanium nitride thin films deposited by reactive sputtering |
| url | http://dx.doi.org/10.1155/APEC.8.249 |
| work_keys_str_mv | AT tmuto electricalpropertiesoftitaniumnitridethinfilmsdepositedbyreactivesputtering AT kkawabata electricalpropertiesoftitaniumnitridethinfilmsdepositedbyreactivesputtering |