Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition
In this research, we mainly increase the adhesion of PMMA substrate and film, which is reflected in the environmental test. This study used plasma-enhanced atomic layer deposition (PEALD) to find the relationship between the intensity of XRD reflection peak and the root-mean-square surface roughness...
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2024-12-01
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| author | Chi-Chieh Wang Cheng-Fu Wang Meng-Chi Li Li-Chen Su Chien-Cheng Kuo |
| author_facet | Chi-Chieh Wang Cheng-Fu Wang Meng-Chi Li Li-Chen Su Chien-Cheng Kuo |
| author_sort | Chi-Chieh Wang |
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| description | In this research, we mainly increase the adhesion of PMMA substrate and film, which is reflected in the environmental test. This study used plasma-enhanced atomic layer deposition (PEALD) to find the relationship between the intensity of XRD reflection peak and the root-mean-square surface roughness (σ<sub>RMS</sub>) of hafnium dioxide (HfO<sub>2</sub>) at different thicknesses by reducing the plasma power at different process temperatures. In this experiment, HfO<sub>2</sub> was found to have the highest intensity of XRD at its maximum thickness. According to the different intensities of XRD of HfO<sub>2</sub> at different thicknesses, aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) was inserted as crystallization cutoff layers, and the two materials were combined into nanolaminates. The corresponding σ<sub>RMS</sub> value also changed from 1.25 to 0.434 nm after treatment under the fourth experimental design. This study improved this mismatch between interfaces by adjusting the yield strength and ductility using Al<sub>2</sub>O<sub>3</sub> layers and by creating an inhibition layer. In addition, through the processing of inserted Al<sub>2</sub>O<sub>3</sub> layers, the degree of crystallization was changed so that the material and substrate could maintain their normal surfaces without cracking after the environmental tests. After inserting five 1 nm thick Al<sub>2</sub>O<sub>3</sub> layers, the environmental test results were improved. The test time was increased from the original 56 h to 352 h. |
| format | Article |
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| institution | Kabale University |
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| language | English |
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| series | Technologies |
| spelling | doaj-art-9f349d5187dc401b831e2ced7d8eeaf22025-01-24T13:50:44ZengMDPI AGTechnologies2227-70802024-12-011311110.3390/technologies13010011Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer DepositionChi-Chieh Wang0Cheng-Fu Wang1Meng-Chi Li2Li-Chen Su3Chien-Cheng Kuo4Department of Optics and Photonics, Thin Film Technology Center, National Central University, Taoyuan City 32001, TaiwanDepartment of Optics and Photonics, Thin Film Technology Center, National Central University, Taoyuan City 32001, TaiwanGeneral Education Center and Organic Electronics Research Center, Ming Chi University of Technology, New Taipei City 24301, TaiwanGeneral Education Center and Organic Electronics Research Center, Ming Chi University of Technology, New Taipei City 24301, TaiwanDepartment of Optics and Photonics, Thin Film Technology Center, National Central University, Taoyuan City 32001, TaiwanIn this research, we mainly increase the adhesion of PMMA substrate and film, which is reflected in the environmental test. This study used plasma-enhanced atomic layer deposition (PEALD) to find the relationship between the intensity of XRD reflection peak and the root-mean-square surface roughness (σ<sub>RMS</sub>) of hafnium dioxide (HfO<sub>2</sub>) at different thicknesses by reducing the plasma power at different process temperatures. In this experiment, HfO<sub>2</sub> was found to have the highest intensity of XRD at its maximum thickness. According to the different intensities of XRD of HfO<sub>2</sub> at different thicknesses, aluminum oxide (Al<sub>2</sub>O<sub>3</sub>) was inserted as crystallization cutoff layers, and the two materials were combined into nanolaminates. The corresponding σ<sub>RMS</sub> value also changed from 1.25 to 0.434 nm after treatment under the fourth experimental design. This study improved this mismatch between interfaces by adjusting the yield strength and ductility using Al<sub>2</sub>O<sub>3</sub> layers and by creating an inhibition layer. In addition, through the processing of inserted Al<sub>2</sub>O<sub>3</sub> layers, the degree of crystallization was changed so that the material and substrate could maintain their normal surfaces without cracking after the environmental tests. After inserting five 1 nm thick Al<sub>2</sub>O<sub>3</sub> layers, the environmental test results were improved. The test time was increased from the original 56 h to 352 h.https://www.mdpi.com/2227-7080/13/1/11nanolaminatesPEALDcrystallizationsurface roughnessductilityhafnium dioxide |
| spellingShingle | Chi-Chieh Wang Cheng-Fu Wang Meng-Chi Li Li-Chen Su Chien-Cheng Kuo Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition Technologies nanolaminates PEALD crystallization surface roughness ductility hafnium dioxide |
| title | Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition |
| title_full | Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition |
| title_fullStr | Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition |
| title_full_unstemmed | Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition |
| title_short | Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition |
| title_sort | inhibition of anti reflection film cracks on plastic substrates using nanolaminate layer deposition in plasma enhanced atomic layer deposition |
| topic | nanolaminates PEALD crystallization surface roughness ductility hafnium dioxide |
| url | https://www.mdpi.com/2227-7080/13/1/11 |
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