Design Tradeoff of Hot Carrier Immunity and Robustness in LDMOS with Grounded Gate Shield

LDMOS devices with grounded gate shield structures variations were simulated and tested, aiming to address hot carrier immunity and robustness concurrently. Optimal configuration of grounded gate shield structure was found to reduce local electrical field strength at gate-to-drain overlap for better...

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Main Authors: Haifeng Mo, Yaohui Zhang, Helun Song
Format: Article
Language:English
Published: Wiley 2019-01-01
Series:Active and Passive Electronic Components
Online Access:http://dx.doi.org/10.1155/2019/1928494
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author Haifeng Mo
Yaohui Zhang
Helun Song
author_facet Haifeng Mo
Yaohui Zhang
Helun Song
author_sort Haifeng Mo
collection DOAJ
description LDMOS devices with grounded gate shield structures variations were simulated and tested, aiming to address hot carrier immunity and robustness concurrently. Optimal configuration of grounded gate shield structure was found to reduce local electrical field strength at gate-to-drain overlap for better hot carrier immunity, and to achieve uniform E-field distribution on drain side for robustness as well. Design trade off of hot carrier immunity (HCI) and robustness is analyzed by simulation and silicon data.
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institution Kabale University
issn 0882-7516
1563-5031
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publishDate 2019-01-01
publisher Wiley
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series Active and Passive Electronic Components
spelling doaj-art-9905475f8f9943edb7a543bb54c17bc22025-08-20T03:37:05ZengWileyActive and Passive Electronic Components0882-75161563-50312019-01-01201910.1155/2019/19284941928494Design Tradeoff of Hot Carrier Immunity and Robustness in LDMOS with Grounded Gate ShieldHaifeng Mo0Yaohui Zhang1Helun Song2Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, ChinaSuzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, ChinaSuzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, ChinaLDMOS devices with grounded gate shield structures variations were simulated and tested, aiming to address hot carrier immunity and robustness concurrently. Optimal configuration of grounded gate shield structure was found to reduce local electrical field strength at gate-to-drain overlap for better hot carrier immunity, and to achieve uniform E-field distribution on drain side for robustness as well. Design trade off of hot carrier immunity (HCI) and robustness is analyzed by simulation and silicon data.http://dx.doi.org/10.1155/2019/1928494
spellingShingle Haifeng Mo
Yaohui Zhang
Helun Song
Design Tradeoff of Hot Carrier Immunity and Robustness in LDMOS with Grounded Gate Shield
Active and Passive Electronic Components
title Design Tradeoff of Hot Carrier Immunity and Robustness in LDMOS with Grounded Gate Shield
title_full Design Tradeoff of Hot Carrier Immunity and Robustness in LDMOS with Grounded Gate Shield
title_fullStr Design Tradeoff of Hot Carrier Immunity and Robustness in LDMOS with Grounded Gate Shield
title_full_unstemmed Design Tradeoff of Hot Carrier Immunity and Robustness in LDMOS with Grounded Gate Shield
title_short Design Tradeoff of Hot Carrier Immunity and Robustness in LDMOS with Grounded Gate Shield
title_sort design tradeoff of hot carrier immunity and robustness in ldmos with grounded gate shield
url http://dx.doi.org/10.1155/2019/1928494
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