A Review on Reactor Design and Surface Modification of Atomic Layer Deposition for Functional Nanoparticles
Abstract Atomic layer deposition (ALD) has emerged as a promising method for surface modification of functional nanoparticles, enabling the versatile applications in energy, catalysis, and human health. The self‐limiting surface chemistry of ALD allows not only the coating of ultrathin and conformal...
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| Main Authors: | Guanghui Yan, Gaoshan Huang, Jianjun Shi, Yi Ouyang, Xueqin Zuo, Zhihao Bao, Yongfeng Mei |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-07-01
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| Series: | Advanced Materials Interfaces |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/admi.202500140 |
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