Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst
We examined an environmentally friendly photoresist removal method using H radicals produced by decomposing hydrogen on a hot iridium catalyst. We examined the relationship between photoresist removal rate and its surface temperature using thin film interference and the removal properties using H ra...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley
2017-01-01
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| Series: | International Journal of Polymer Science |
| Online Access: | http://dx.doi.org/10.1155/2017/2983042 |
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| _version_ | 1849403850381852672 |
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| author | Masashi Yamamoto Shiro Nagaoka Hironobu Umemoto Keisuke Ohdaira Takashi Nishiyama Hideo Horibe |
| author_facet | Masashi Yamamoto Shiro Nagaoka Hironobu Umemoto Keisuke Ohdaira Takashi Nishiyama Hideo Horibe |
| author_sort | Masashi Yamamoto |
| collection | DOAJ |
| description | We examined an environmentally friendly photoresist removal method using H radicals produced by decomposing hydrogen on a hot iridium catalyst. We examined the relationship between photoresist removal rate and its surface temperature using thin film interference and the removal properties using H radicals produced by the Ir catalyst. Decomposition behavior at polymer surface by radicals may be analyzed in further detail from the aspect of kinetics. Additionally, we investigated the oxygen addition effects on the removal rate. The photoresist removal rate increased with the oxygen additive amount and then decreased more gradually than in the case of using W filament. The increasing behavior was similar but there was a large difference between W and Ir catalyst in the decreasing behavior. |
| format | Article |
| id | doaj-art-976b8e7a4b064cb1aaf5738f3dfc47b9 |
| institution | Kabale University |
| issn | 1687-9422 1687-9430 |
| language | English |
| publishDate | 2017-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Polymer Science |
| spelling | doaj-art-976b8e7a4b064cb1aaf5738f3dfc47b92025-08-20T03:37:09ZengWileyInternational Journal of Polymer Science1687-94221687-94302017-01-01201710.1155/2017/29830422983042Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire CatalystMasashi Yamamoto0Shiro Nagaoka1Hironobu Umemoto2Keisuke Ohdaira3Takashi Nishiyama4Hideo Horibe5Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College, 355 Chokushi-cho, Takamatsu, Kagawa 761-8058, JapanDepartment of Electronic Systems Engineering, National Institute of Technology, Kagawa College, 551 Kohda, Takuma-cho, Mitoyo, Kagawa 769-1192, JapanGraduate School of Integrated Science and Technology, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8561, JapanJapan Advanced Institute of Science and Technology, 1-1 Asahidai, Nomi, Ishikawa 923-1292, JapanGraduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi, Osaka 558-8585, JapanGraduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi, Osaka 558-8585, JapanWe examined an environmentally friendly photoresist removal method using H radicals produced by decomposing hydrogen on a hot iridium catalyst. We examined the relationship between photoresist removal rate and its surface temperature using thin film interference and the removal properties using H radicals produced by the Ir catalyst. Decomposition behavior at polymer surface by radicals may be analyzed in further detail from the aspect of kinetics. Additionally, we investigated the oxygen addition effects on the removal rate. The photoresist removal rate increased with the oxygen additive amount and then decreased more gradually than in the case of using W filament. The increasing behavior was similar but there was a large difference between W and Ir catalyst in the decreasing behavior.http://dx.doi.org/10.1155/2017/2983042 |
| spellingShingle | Masashi Yamamoto Shiro Nagaoka Hironobu Umemoto Keisuke Ohdaira Takashi Nishiyama Hideo Horibe Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst International Journal of Polymer Science |
| title | Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst |
| title_full | Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst |
| title_fullStr | Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst |
| title_full_unstemmed | Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst |
| title_short | Photoresist Removal Using H Radicals Generated by Iridium Hot-Wire Catalyst |
| title_sort | photoresist removal using h radicals generated by iridium hot wire catalyst |
| url | http://dx.doi.org/10.1155/2017/2983042 |
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