Maity, N., Pandey, A., Chakraborty, S., & Roy, M. High-k HfO2 Based Metal-Oxide-Semiconductor Devices Using Silicon and Silicon Carbide Semiconductor. Sumy State University.
Chicago Style (17th ed.) CitationMaity, N.P, A. Pandey, S. Chakraborty, and M. Roy. High-k HfO2 Based Metal-Oxide-Semiconductor Devices Using Silicon and Silicon Carbide Semiconductor. Sumy State University.
MLA (9th ed.) CitationMaity, N.P, et al. High-k HfO2 Based Metal-Oxide-Semiconductor Devices Using Silicon and Silicon Carbide Semiconductor. Sumy State University.
Warning: These citations may not always be 100% accurate.