Surface passivation engineering for stable optoelectronic devices via hydroxyl-free ZnMgO nanoparticles

Abstract ZnMgO nanoparticles (ZMO NPs) are widely used as electron transport layers in optoelectronic devices such as light-emitting diodes (LEDs) and photodiodes (PDs) primarily because of their facile synthesis and excellent electron transport properties. However, the surface hydroxyl groups (‒OH)...

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Main Authors: Seongkeun Oh, Jaehwi Choi, Junhyeok Park, Young Kyun Choi, Taesung Park, Awais Ali, Junhyuk Ahn, Jiwan Kim, Soong Ju Oh
Format: Article
Language:English
Published: SpringerOpen 2025-06-01
Series:Nano Convergence
Subjects:
Online Access:https://doi.org/10.1186/s40580-025-00493-2
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_version_ 1850104069875564544
author Seongkeun Oh
Jaehwi Choi
Junhyeok Park
Young Kyun Choi
Taesung Park
Awais Ali
Junhyuk Ahn
Jiwan Kim
Soong Ju Oh
author_facet Seongkeun Oh
Jaehwi Choi
Junhyeok Park
Young Kyun Choi
Taesung Park
Awais Ali
Junhyuk Ahn
Jiwan Kim
Soong Ju Oh
author_sort Seongkeun Oh
collection DOAJ
description Abstract ZnMgO nanoparticles (ZMO NPs) are widely used as electron transport layers in optoelectronic devices such as light-emitting diodes (LEDs) and photodiodes (PDs) primarily because of their facile synthesis and excellent electron transport properties. However, the surface hydroxyl groups (‒OH) on the ZMO NPs introduce charge traps, inhibit electron transport, and reduce device stability, particularly under ambient humidity and oxygen. Therefore, in this study, an alcohol treatment (AT) method was developed to remove surface ‒OH via proton transfer to effectively reduce trap states and dipole moments and enhance surface passivation. Quantum-dot-based LEDs and PDs fabricated using the AT-based ZMO NPs exhibited improved current density, luminance, and external quantum efficiency compared to the untreated devices. Notably, the methanol-treated devices achieved an operational lifetime of approximately 28 h under ambient conditions, representing a substantial advancement in device stability and performance. The AT approach is a simple and effective strategy for optimizing the ZMO NPs for next-generation optoelectronic applications.
format Article
id doaj-art-948a2e93e09b4f1587015037fc90e032
institution DOAJ
issn 2196-5404
language English
publishDate 2025-06-01
publisher SpringerOpen
record_format Article
series Nano Convergence
spelling doaj-art-948a2e93e09b4f1587015037fc90e0322025-08-20T02:39:24ZengSpringerOpenNano Convergence2196-54042025-06-0112111210.1186/s40580-025-00493-2Surface passivation engineering for stable optoelectronic devices via hydroxyl-free ZnMgO nanoparticlesSeongkeun Oh0Jaehwi Choi1Junhyeok Park2Young Kyun Choi3Taesung Park4Awais Ali5Junhyuk Ahn6Jiwan Kim7Soong Ju Oh8Department of Materials Science and Engineering, Korea UniversityDepartment of Advanced Materials Engineering, Kyonggi UniversityDepartment of Materials Science and Engineering, Korea UniversityDepartment of Materials Science and Engineering, Korea UniversityDepartment of Materials Science and Engineering, Korea UniversityDepartment of Materials Science and Engineering, Korea UniversityDepartment of Materials Science and Engineering, Korea UniversityDepartment of Advanced Materials Engineering, Kyonggi UniversityDepartment of Materials Science and Engineering, Korea UniversityAbstract ZnMgO nanoparticles (ZMO NPs) are widely used as electron transport layers in optoelectronic devices such as light-emitting diodes (LEDs) and photodiodes (PDs) primarily because of their facile synthesis and excellent electron transport properties. However, the surface hydroxyl groups (‒OH) on the ZMO NPs introduce charge traps, inhibit electron transport, and reduce device stability, particularly under ambient humidity and oxygen. Therefore, in this study, an alcohol treatment (AT) method was developed to remove surface ‒OH via proton transfer to effectively reduce trap states and dipole moments and enhance surface passivation. Quantum-dot-based LEDs and PDs fabricated using the AT-based ZMO NPs exhibited improved current density, luminance, and external quantum efficiency compared to the untreated devices. Notably, the methanol-treated devices achieved an operational lifetime of approximately 28 h under ambient conditions, representing a substantial advancement in device stability and performance. The AT approach is a simple and effective strategy for optimizing the ZMO NPs for next-generation optoelectronic applications.https://doi.org/10.1186/s40580-025-00493-2Quantum dotSurface engineeringOptoelectronic devicesHydroxyl-freeAlcohol treatment
spellingShingle Seongkeun Oh
Jaehwi Choi
Junhyeok Park
Young Kyun Choi
Taesung Park
Awais Ali
Junhyuk Ahn
Jiwan Kim
Soong Ju Oh
Surface passivation engineering for stable optoelectronic devices via hydroxyl-free ZnMgO nanoparticles
Nano Convergence
Quantum dot
Surface engineering
Optoelectronic devices
Hydroxyl-free
Alcohol treatment
title Surface passivation engineering for stable optoelectronic devices via hydroxyl-free ZnMgO nanoparticles
title_full Surface passivation engineering for stable optoelectronic devices via hydroxyl-free ZnMgO nanoparticles
title_fullStr Surface passivation engineering for stable optoelectronic devices via hydroxyl-free ZnMgO nanoparticles
title_full_unstemmed Surface passivation engineering for stable optoelectronic devices via hydroxyl-free ZnMgO nanoparticles
title_short Surface passivation engineering for stable optoelectronic devices via hydroxyl-free ZnMgO nanoparticles
title_sort surface passivation engineering for stable optoelectronic devices via hydroxyl free znmgo nanoparticles
topic Quantum dot
Surface engineering
Optoelectronic devices
Hydroxyl-free
Alcohol treatment
url https://doi.org/10.1186/s40580-025-00493-2
work_keys_str_mv AT seongkeunoh surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles
AT jaehwichoi surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles
AT junhyeokpark surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles
AT youngkyunchoi surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles
AT taesungpark surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles
AT awaisali surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles
AT junhyukahn surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles
AT jiwankim surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles
AT soongjuoh surfacepassivationengineeringforstableoptoelectronicdevicesviahydroxylfreeznmgonanoparticles