Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals

Technostress or reaction to techno-stressors? Validation of bilingual techno-stressors index (TSI-II) and a second-order formative model of techno-distress among Canadian legal professionals

Technostress is a phenomenon that needs to be seen as a process rather than a result. This requires the adaptation of measurement tools accordingly. Legal professionals are particularly exposed to technostress. This paper presents the validation of the TSI-II, an updated and bilingual version of the...

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Bibliographic Details
Main Authors: Nathalie Cadieux, Audrée Bethsa Camille, Jean Cadieux, Marie-Michelle Gouin, Éveline Morin, Pierre-Luc Fournier
Format: Article
Language:English
Published: Elsevier 2024-12-01
Series:Computers in Human Behavior Reports
Subjects:
Techno-stressors
Technostress
Techno-distress
Bilingual measurement scale
Second-order formative model
Online Access:http://www.sciencedirect.com/science/article/pii/S2451958824001180
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