High-Aspect-Ratio Shape Replica Mold Fabrication Using Nanoimprinting and Silver Ink as Etching Mask
Effective high-aspect-ratio molds that minimize vacuum processes are becoming increasingly important for producing metalenses and other devices. To fabricate a high-aspect-ratio structure, a metal film must be used as a mask for dry etching, typically achieved via vacuum deposition. To avoid this va...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-01-01
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| Series: | Nanomanufacturing |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2673-687X/5/1/2 |
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