A warpage-free Si3N4 slurry strategy for vat photopolymerization

Si3N4 ceramics are promising wave-transparent materials with excellent mechanical and dielectric properties. Vat photopolymerization (VPP) three-dimensional (3D) printing provides a strategy for preparing ceramics with controllable complex structures. However, the difficulty in solidifying the slurr...

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Main Authors: Chi Huang, Liya Zheng, Zhilin Tian, Lei Shi, Bin Li
Format: Article
Language:English
Published: Tsinghua University Press 2025-01-01
Series:Journal of Advanced Ceramics
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Online Access:https://www.sciopen.com/article/10.26599/JAC.2024.9221016
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_version_ 1832589856728940544
author Chi Huang
Liya Zheng
Zhilin Tian
Lei Shi
Bin Li
author_facet Chi Huang
Liya Zheng
Zhilin Tian
Lei Shi
Bin Li
author_sort Chi Huang
collection DOAJ
description Si3N4 ceramics are promising wave-transparent materials with excellent mechanical and dielectric properties. Vat photopolymerization (VPP) three-dimensional (3D) printing provides a strategy for preparing ceramics with controllable complex structures. However, the difficulty in solidifying the slurry due to partial ultraviolet (UV) light absorption and the high refractive index of Si3N4 particles during the VPP process severely hinder the molding of Si3N4 ceramics. A higher laser power must be used to increase the curing depth, which generates large internal stresses and warps the samples. This study presents a method to solve the warpage problem during VPP-3D printing using tributyl citrate as a plasticizer. The plasticizer can weaken the force between polymer molecular chains and reduce the internal stress of the green body. Warpage decreases gradually with increasing tributyl citrate content, and the warpage decreases to 0% when the plasticizer content reaches 30 wt% at high laser powers from 600 to 750 mW. Samples with different layer thicknesses were printed, and the optimum thickness of 40 μm was obtained, at which the sintered Si3N4 samples possessed a unique combination of mechanical properties, including a bending strength of 338.29±12.08 MPa and a fracture toughness of 6.94±0.11 MPa·m1/2 for the loading direction perpendicular to the build surface and 5.37±0.99 MPa·m1/2 for the loading direction parallel to the build surface. The dielectric constant of all the samples is maintained in the range of 5.462–6.414. This work is expected to guide vat photopolymerization and the preparation of complex Si3N4 ceramic components.
format Article
id doaj-art-91d6dfe8b2a84168b6265f524154ac9c
institution Kabale University
issn 2226-4108
2227-8508
language English
publishDate 2025-01-01
publisher Tsinghua University Press
record_format Article
series Journal of Advanced Ceramics
spelling doaj-art-91d6dfe8b2a84168b6265f524154ac9c2025-01-24T07:52:15ZengTsinghua University PressJournal of Advanced Ceramics2226-41082227-85082025-01-01141922101610.26599/JAC.2024.9221016A warpage-free Si3N4 slurry strategy for vat photopolymerizationChi Huang0Liya Zheng1Zhilin Tian2Lei Shi3Bin Li4School of Materials, Shenzhen Campus of Sun Yat-sen University, Shenzhen 518107, ChinaSchool of Materials, Shenzhen Campus of Sun Yat-sen University, Shenzhen 518107, ChinaSchool of Materials, Shenzhen Campus of Sun Yat-sen University, Shenzhen 518107, ChinaSchool of Materials, Shenzhen Campus of Sun Yat-sen University, Shenzhen 518107, ChinaSchool of Materials, Shenzhen Campus of Sun Yat-sen University, Shenzhen 518107, ChinaSi3N4 ceramics are promising wave-transparent materials with excellent mechanical and dielectric properties. Vat photopolymerization (VPP) three-dimensional (3D) printing provides a strategy for preparing ceramics with controllable complex structures. However, the difficulty in solidifying the slurry due to partial ultraviolet (UV) light absorption and the high refractive index of Si3N4 particles during the VPP process severely hinder the molding of Si3N4 ceramics. A higher laser power must be used to increase the curing depth, which generates large internal stresses and warps the samples. This study presents a method to solve the warpage problem during VPP-3D printing using tributyl citrate as a plasticizer. The plasticizer can weaken the force between polymer molecular chains and reduce the internal stress of the green body. Warpage decreases gradually with increasing tributyl citrate content, and the warpage decreases to 0% when the plasticizer content reaches 30 wt% at high laser powers from 600 to 750 mW. Samples with different layer thicknesses were printed, and the optimum thickness of 40 μm was obtained, at which the sintered Si3N4 samples possessed a unique combination of mechanical properties, including a bending strength of 338.29±12.08 MPa and a fracture toughness of 6.94±0.11 MPa·m1/2 for the loading direction perpendicular to the build surface and 5.37±0.99 MPa·m1/2 for the loading direction parallel to the build surface. The dielectric constant of all the samples is maintained in the range of 5.462–6.414. This work is expected to guide vat photopolymerization and the preparation of complex Si3N4 ceramic components.https://www.sciopen.com/article/10.26599/JAC.2024.9221016three-dimensional (3d) printingvat photopolymerizationsi3n4warpagemechanical properties
spellingShingle Chi Huang
Liya Zheng
Zhilin Tian
Lei Shi
Bin Li
A warpage-free Si3N4 slurry strategy for vat photopolymerization
Journal of Advanced Ceramics
three-dimensional (3d) printing
vat photopolymerization
si3n4
warpage
mechanical properties
title A warpage-free Si3N4 slurry strategy for vat photopolymerization
title_full A warpage-free Si3N4 slurry strategy for vat photopolymerization
title_fullStr A warpage-free Si3N4 slurry strategy for vat photopolymerization
title_full_unstemmed A warpage-free Si3N4 slurry strategy for vat photopolymerization
title_short A warpage-free Si3N4 slurry strategy for vat photopolymerization
title_sort warpage free si3n4 slurry strategy for vat photopolymerization
topic three-dimensional (3d) printing
vat photopolymerization
si3n4
warpage
mechanical properties
url https://www.sciopen.com/article/10.26599/JAC.2024.9221016
work_keys_str_mv AT chihuang awarpagefreesi3n4slurrystrategyforvatphotopolymerization
AT liyazheng awarpagefreesi3n4slurrystrategyforvatphotopolymerization
AT zhilintian awarpagefreesi3n4slurrystrategyforvatphotopolymerization
AT leishi awarpagefreesi3n4slurrystrategyforvatphotopolymerization
AT binli awarpagefreesi3n4slurrystrategyforvatphotopolymerization
AT chihuang warpagefreesi3n4slurrystrategyforvatphotopolymerization
AT liyazheng warpagefreesi3n4slurrystrategyforvatphotopolymerization
AT zhilintian warpagefreesi3n4slurrystrategyforvatphotopolymerization
AT leishi warpagefreesi3n4slurrystrategyforvatphotopolymerization
AT binli warpagefreesi3n4slurrystrategyforvatphotopolymerization