Advanced optical nanolithography by enhanced transmission through bull’s eye nanostructured meta-mask
Plasmonic optical nanolithography using extraordinary optical transmission through a metallic nanohole mask has been actively applied to the high-resolution fabrication of nanostructures over a large area. Although there have been studies on improving the nanostructure fabrication performance in opt...
Saved in:
| Main Authors: | Kim Taeyeon, Ahn Heesang, Kim Soojung, Song Hyerin, Choi Jong-ryul, Kim Kyujung |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2023-04-01
|
| Series: | Nanophotonics |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/nanoph-2023-0145 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
A study on flare minimisation in EUV lithography by post‐layout re‐allocation of wire segments
by: Sudipta Paul, et al.
Published: (2021-07-01) -
Fabrication of 3D Nanostructures via AFM-Based Nanolithography
by: Lorenzo Vincenti, et al.
Published: (2024-03-01) -
Exploiting Extraordinary Optical Transmission in Plasmonic Slit Nanoantennas for Sensor Applications
by: Ricardo A. Marques Lameirinhas, et al.
Published: (2024-01-01) -
Proton beam writing: World experience and prospectives in Ukraine
by: H. Ye. Polozhii, et al.
Published: (2023-03-01) -
Nano-Scale Patterning of Silicon Nanoparticles on Silicon Substrate by Dip-Pen-Nanolithography
by: A. Kumar, et al.
Published: (2011-01-01)