The Analogue Design Research of Precursor Gas Flow Field in the Deposition Chamber for Aluminide Coating Device Deposited by the CVD Method
For preparing the uniform CVD aluminide coating, the flow field distribution uniformity of precursor gas in the deposition chamber ought to be controlled. In this work, the computational fluid dynamics (CFD) method was applied to conduct analogue simulation on the precursor fluid flow field in the d...
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| Main Author: | |
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| Format: | Article |
| Language: | zho |
| Published: |
Editorial Department of Materials Protection
2021-05-01
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| Series: | Cailiao Baohu |
| Subjects: | |
| Online Access: | http://www.mat-pro.com/fileup/1001-1560/PDF/20210501.pdf |
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