Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION
Properties and deposition of continuous thin zinc oxide films by chemical on the monocrystalline silicon substrates with zinc oxide seed layer formed by atomic layer deposition are studied. Obtained hybrid zinc oxide structures consist of vertically oriented crystallites packed in uniform continuous...
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| Format: | Article |
| Language: | Russian |
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Educational institution «Belarusian State University of Informatics and Radioelectronics»
2019-06-01
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| Series: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
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| Online Access: | https://doklady.bsuir.by/jour/article/view/665 |
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| _version_ | 1849398410836180992 |
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| author | E. B. Chubenko V. P. Bondarenko V. A. Pilipenko K. .. Topalli A. K. Okyay |
| author_facet | E. B. Chubenko V. P. Bondarenko V. A. Pilipenko K. .. Topalli A. K. Okyay |
| author_sort | E. B. Chubenko |
| collection | DOAJ |
| description | Properties and deposition of continuous thin zinc oxide films by chemical on the monocrystalline silicon substrates with zinc oxide seed layer formed by atomic layer deposition are studied. Obtained hybrid zinc oxide structures consist of vertically oriented crystallites packed in uniform continuous film. Optical and electrical properties of the films are measured. It is shown, that deposited zinc oxide films demonstrate photoluminescence in the visible range of electromagnetic spectra with maximum at 600-700 nm. Luminescence band in the near UV region at 380 nm, associated with band-to-band radiative recombination, is also measured. The resistivity of the obtained zinc oxide films is about 0.7 Ohm·cm. |
| format | Article |
| id | doaj-art-8bfda3f7900541c286ea6fa3e535f142 |
| institution | Kabale University |
| issn | 1729-7648 |
| language | Russian |
| publishDate | 2019-06-01 |
| publisher | Educational institution «Belarusian State University of Informatics and Radioelectronics» |
| record_format | Article |
| series | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| spelling | doaj-art-8bfda3f7900541c286ea6fa3e535f1422025-08-20T03:38:38ZrusEducational institution «Belarusian State University of Informatics and Radioelectronics»Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki1729-76482019-06-01042834664Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITIONE. B. Chubenko0V. P. Bondarenko1V. A. Pilipenko2K. .. Topalli3A. K. Okyay4Белорусский государственный университет информатики и радиоэлектроникиБелорусский государственный университет информатики и радиоэлектроникиНПЦ «Белмикросистемы» ОАО «Интеграл»Department of Electrical and Electronics Engineering, Bilkent UniversityDepartment of Electrical and Electronics Engineering, Bilkent UniversityProperties and deposition of continuous thin zinc oxide films by chemical on the monocrystalline silicon substrates with zinc oxide seed layer formed by atomic layer deposition are studied. Obtained hybrid zinc oxide structures consist of vertically oriented crystallites packed in uniform continuous film. Optical and electrical properties of the films are measured. It is shown, that deposited zinc oxide films demonstrate photoluminescence in the visible range of electromagnetic spectra with maximum at 600-700 nm. Luminescence band in the near UV region at 380 nm, associated with band-to-band radiative recombination, is also measured. The resistivity of the obtained zinc oxide films is about 0.7 Ohm·cm.https://doklady.bsuir.by/jour/article/view/665zinc oxidehydrothermal depositionatomic layer depositionphotoluminescencex-ray diffraction |
| spellingShingle | E. B. Chubenko V. P. Bondarenko V. A. Pilipenko K. .. Topalli A. K. Okyay Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki zinc oxide hydrothermal deposition atomic layer deposition photoluminescence x-ray diffraction |
| title | Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION |
| title_full | Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION |
| title_fullStr | Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION |
| title_full_unstemmed | Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION |
| title_short | Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION |
| title_sort | formation of zinc oxide thin films by combined method of hydrothermal and layered atom deposition |
| topic | zinc oxide hydrothermal deposition atomic layer deposition photoluminescence x-ray diffraction |
| url | https://doklady.bsuir.by/jour/article/view/665 |
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