Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION

Properties and deposition of continuous thin zinc oxide films by chemical on the monocrystalline silicon substrates with zinc oxide seed layer formed by atomic layer deposition are studied. Obtained hybrid zinc oxide structures consist of vertically oriented crystallites packed in uniform continuous...

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Main Authors: E. B. Chubenko, V. P. Bondarenko, V. A. Pilipenko, K. .. Topalli, A. K. Okyay
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2019-06-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
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Online Access:https://doklady.bsuir.by/jour/article/view/665
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author E. B. Chubenko
V. P. Bondarenko
V. A. Pilipenko
K. .. Topalli
A. K. Okyay
author_facet E. B. Chubenko
V. P. Bondarenko
V. A. Pilipenko
K. .. Topalli
A. K. Okyay
author_sort E. B. Chubenko
collection DOAJ
description Properties and deposition of continuous thin zinc oxide films by chemical on the monocrystalline silicon substrates with zinc oxide seed layer formed by atomic layer deposition are studied. Obtained hybrid zinc oxide structures consist of vertically oriented crystallites packed in uniform continuous film. Optical and electrical properties of the films are measured. It is shown, that deposited zinc oxide films demonstrate photoluminescence in the visible range of electromagnetic spectra with maximum at 600-700 nm. Luminescence band in the near UV region at 380 nm, associated with band-to-band radiative recombination, is also measured. The resistivity of the obtained zinc oxide films is about 0.7 Ohm·cm.
format Article
id doaj-art-8bfda3f7900541c286ea6fa3e535f142
institution Kabale University
issn 1729-7648
language Russian
publishDate 2019-06-01
publisher Educational institution «Belarusian State University of Informatics and Radioelectronics»
record_format Article
series Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
spelling doaj-art-8bfda3f7900541c286ea6fa3e535f1422025-08-20T03:38:38ZrusEducational institution «Belarusian State University of Informatics and Radioelectronics»Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki1729-76482019-06-01042834664Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITIONE. B. Chubenko0V. P. Bondarenko1V. A. Pilipenko2K. .. Topalli3A. K. Okyay4Белорусский государственный университет информатики и радиоэлектроникиБелорусский государственный университет информатики и радиоэлектроникиНПЦ «Белмикросистемы» ОАО «Интеграл»Department of Electrical and Electronics Engineering, Bilkent UniversityDepartment of Electrical and Electronics Engineering, Bilkent UniversityProperties and deposition of continuous thin zinc oxide films by chemical on the monocrystalline silicon substrates with zinc oxide seed layer formed by atomic layer deposition are studied. Obtained hybrid zinc oxide structures consist of vertically oriented crystallites packed in uniform continuous film. Optical and electrical properties of the films are measured. It is shown, that deposited zinc oxide films demonstrate photoluminescence in the visible range of electromagnetic spectra with maximum at 600-700 nm. Luminescence band in the near UV region at 380 nm, associated with band-to-band radiative recombination, is also measured. The resistivity of the obtained zinc oxide films is about 0.7 Ohm·cm.https://doklady.bsuir.by/jour/article/view/665zinc oxidehydrothermal depositionatomic layer depositionphotoluminescencex-ray diffraction
spellingShingle E. B. Chubenko
V. P. Bondarenko
V. A. Pilipenko
K. .. Topalli
A. K. Okyay
Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION
Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
zinc oxide
hydrothermal deposition
atomic layer deposition
photoluminescence
x-ray diffraction
title Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION
title_full Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION
title_fullStr Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION
title_full_unstemmed Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION
title_short Formation OF ZINC OXIDE THIN FILMS BY COMBINED METHOD OF HYDROTHERMAL AND LAYERED ATOM DEPOSITION
title_sort formation of zinc oxide thin films by combined method of hydrothermal and layered atom deposition
topic zinc oxide
hydrothermal deposition
atomic layer deposition
photoluminescence
x-ray diffraction
url https://doklady.bsuir.by/jour/article/view/665
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AT vpbondarenko formationofzincoxidethinfilmsbycombinedmethodofhydrothermalandlayeredatomdeposition
AT vapilipenko formationofzincoxidethinfilmsbycombinedmethodofhydrothermalandlayeredatomdeposition
AT ktopalli formationofzincoxidethinfilmsbycombinedmethodofhydrothermalandlayeredatomdeposition
AT akokyay formationofzincoxidethinfilmsbycombinedmethodofhydrothermalandlayeredatomdeposition