Two-dimensional transition metal dichalcogenides for post-silicon electronics

Rapid advancements in information technology push the explosive growth in data volume, requiring greater computing-capability logic circuits. However, conventional computing-capability improving technology, which mainly relies on increasing transistor number, encounters a significant challenge due t...

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Main Authors: Zhang Xiankun, Zhao Hang, Wei Xiaofu, Zhang Yanzhe, Zhang Zheng, Zhang Yue
Format: Article
Language:English
Published: Science Press 2023-06-01
Series:National Science Open
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Online Access:https://www.sciengine.com/doi/10.1360/nso/20230015
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author Zhang Xiankun
Zhao Hang
Wei Xiaofu
Zhang Yanzhe
Zhang Zheng
Zhang Yue
author_facet Zhang Xiankun
Zhao Hang
Wei Xiaofu
Zhang Yanzhe
Zhang Zheng
Zhang Yue
author_sort Zhang Xiankun
collection DOAJ
description Rapid advancements in information technology push the explosive growth in data volume, requiring greater computing-capability logic circuits. However, conventional computing-capability improving technology, which mainly relies on increasing transistor number, encounters a significant challenge due to the weak field-effect characteristics of bulk silicon-based semiconductors. Still, the ultra-thin layered bodies of two-dimensional transition metal dichalcogenides (2D-TMDCs) materials enable excellent field-effect characteristics and multiple gate control ports, facilitating the integration of the functions of multiple transistors into one. Generally, the computing-capability improvement of the transistor cell in logic circuits will greatly alleviate the challenge in transistor numbers. In other words, one can only use a small number, or even just one, 2D-TMDCs-based transistors to conduct the sophisticated logic operations that have to be realized by using many traditional transistors. In this review, from material selection, device structure optimization, and circuit architecture design, we discuss the developments, challenges, and prospects for 2D-TMDCs-based logic circuits.
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id doaj-art-8a8b95a612054fd390fe067d3129e44a
institution OA Journals
issn 2097-1168
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publishDate 2023-06-01
publisher Science Press
record_format Article
series National Science Open
spelling doaj-art-8a8b95a612054fd390fe067d3129e44a2025-08-20T02:02:21ZengScience PressNational Science Open2097-11682023-06-01210.1360/nso/20230015eb33e642Two-dimensional transition metal dichalcogenides for post-silicon electronicsZhang Xiankun0Zhao Hang1Wei Xiaofu2Zhang Yanzhe3Zhang Zheng4Zhang Yue5["Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, China","Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China"]["Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, China","Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China"]["Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, China","Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China"]["Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, China","Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China"]["Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, China","Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China"]["Academy for Advanced Interdisciplinary Science and Technology, Beijing Advanced Innovation Center for Materials Genome Engineering, University of Science and Technology Beijing, Beijing 100083, China","Beijing Key Laboratory for Advanced Energy Materials and Technologies, School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China"]Rapid advancements in information technology push the explosive growth in data volume, requiring greater computing-capability logic circuits. However, conventional computing-capability improving technology, which mainly relies on increasing transistor number, encounters a significant challenge due to the weak field-effect characteristics of bulk silicon-based semiconductors. Still, the ultra-thin layered bodies of two-dimensional transition metal dichalcogenides (2D-TMDCs) materials enable excellent field-effect characteristics and multiple gate control ports, facilitating the integration of the functions of multiple transistors into one. Generally, the computing-capability improvement of the transistor cell in logic circuits will greatly alleviate the challenge in transistor numbers. In other words, one can only use a small number, or even just one, 2D-TMDCs-based transistors to conduct the sophisticated logic operations that have to be realized by using many traditional transistors. In this review, from material selection, device structure optimization, and circuit architecture design, we discuss the developments, challenges, and prospects for 2D-TMDCs-based logic circuits.https://www.sciengine.com/doi/10.1360/nso/20230015logic circuitstwo-dimensional transition metal dichalcogenidescomputing capabilitypost-silicon electronicstransistor number
spellingShingle Zhang Xiankun
Zhao Hang
Wei Xiaofu
Zhang Yanzhe
Zhang Zheng
Zhang Yue
Two-dimensional transition metal dichalcogenides for post-silicon electronics
National Science Open
logic circuits
two-dimensional transition metal dichalcogenides
computing capability
post-silicon electronics
transistor number
title Two-dimensional transition metal dichalcogenides for post-silicon electronics
title_full Two-dimensional transition metal dichalcogenides for post-silicon electronics
title_fullStr Two-dimensional transition metal dichalcogenides for post-silicon electronics
title_full_unstemmed Two-dimensional transition metal dichalcogenides for post-silicon electronics
title_short Two-dimensional transition metal dichalcogenides for post-silicon electronics
title_sort two dimensional transition metal dichalcogenides for post silicon electronics
topic logic circuits
two-dimensional transition metal dichalcogenides
computing capability
post-silicon electronics
transistor number
url https://www.sciengine.com/doi/10.1360/nso/20230015
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AT zhangyanzhe twodimensionaltransitionmetaldichalcogenidesforpostsiliconelectronics
AT zhangzheng twodimensionaltransitionmetaldichalcogenidesforpostsiliconelectronics
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