The Effect of Laser Annealing on the Surface Morphology and Optical Characteristics of Nanosilicon Films
The effect of laser annealing on the surface microrelief and optical properties of nanocrystalline silicon films, prepared by low pressure chemical vapor deposition, has been investigated. It is shown that under the interaction with the laser radiation recrystallization takes place in the films, due...
Saved in:
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Sumy State University
2015-03-01
|
| Series: | Журнал нано- та електронної фізики |
| Subjects: | |
| Online Access: | http://jnep.sumdu.edu.ua/download/numbers/2015/1/articles/jnep_2015_V7_01033.pdf |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | The effect of laser annealing on the surface microrelief and optical properties of nanocrystalline silicon films, prepared by low pressure chemical vapor deposition, has been investigated. It is shown that under the interaction with the laser radiation recrystallization takes place in the films, due to which there is a smoothing of surface irregularities and forming of grain-agglomerates. These structural changes lead to the decrease in the content of the silicon oxide films by reducing the area of the grain boundaries. The additional peak at 480 nm is observed in the absorption spectrum of the films. |
|---|---|
| ISSN: | 2077-6772 |