A buried tunnel junction 940 nm VCSEL for achieving thermal diffusion characteristics

To investigate the performance degradation of a vertical-cavity surface-emitting laser (VCSEL) caused by self-heating effects, a 940 nm VCSEL with a buried tunnel junction (BTJ) and an aperture size of 10 μm was designed. The BTJ-type VCSEL achieves a 39.38% higher peak power (19.96 mW), a 3.26% hig...

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Main Authors: Linjin Song, Zhigang Jia, Wei Jia, Shufang Ma, Lin Shang, Hailiang Dong
Format: Article
Language:English
Published: AIP Publishing LLC 2025-05-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0267467
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author Linjin Song
Zhigang Jia
Wei Jia
Shufang Ma
Lin Shang
Hailiang Dong
author_facet Linjin Song
Zhigang Jia
Wei Jia
Shufang Ma
Lin Shang
Hailiang Dong
author_sort Linjin Song
collection DOAJ
description To investigate the performance degradation of a vertical-cavity surface-emitting laser (VCSEL) caused by self-heating effects, a 940 nm VCSEL with a buried tunnel junction (BTJ) and an aperture size of 10 μm was designed. The BTJ-type VCSEL achieves a 39.38% higher peak power (19.96 mW), a 3.26% higher peak power conversion efficiency (46.41%), and a 24.97% lower differential resistance (37.32 Ω), and the thermal rollover current is delayed to 6.07 mA than conventional design. When the injection current is 20 mA, the BTJ-type VCSEL exhibits a low temperature and Auger recombination rate, while the stimulated recombination rate is high. In addition, the BTJ-type VCSEL shows a small far-field divergence angle and good beam quality. Therefore, the designed BTJ-type VCSEL offers valuable guidance for the preparation of high-reliability and long-lifetime VCSEL.
format Article
id doaj-art-87bcbcdeaea1420694a67da35fb0ed9a
institution OA Journals
issn 2158-3226
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publishDate 2025-05-01
publisher AIP Publishing LLC
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series AIP Advances
spelling doaj-art-87bcbcdeaea1420694a67da35fb0ed9a2025-08-20T02:10:06ZengAIP Publishing LLCAIP Advances2158-32262025-05-01155055231055231-810.1063/5.0267467A buried tunnel junction 940 nm VCSEL for achieving thermal diffusion characteristicsLinjin Song0Zhigang Jia1Wei Jia2Shufang Ma3Lin Shang4Hailiang Dong5Key Laboratory of Interface Science and Engineering in Advanced Materials of Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials of Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials of Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, ChinaXi’an Key Laboratory of Compound Semiconductor Materials and Devices, School of Physics & Information Science, Shaanxi University of Science and Technology, Xi’an 710021, People’s Republic of ChinaXi’an Key Laboratory of Compound Semiconductor Materials and Devices, School of Physics & Information Science, Shaanxi University of Science and Technology, Xi’an 710021, People’s Republic of ChinaKey Laboratory of Interface Science and Engineering in Advanced Materials of Ministry of Education, Taiyuan University of Technology, Taiyuan 030024, ChinaTo investigate the performance degradation of a vertical-cavity surface-emitting laser (VCSEL) caused by self-heating effects, a 940 nm VCSEL with a buried tunnel junction (BTJ) and an aperture size of 10 μm was designed. The BTJ-type VCSEL achieves a 39.38% higher peak power (19.96 mW), a 3.26% higher peak power conversion efficiency (46.41%), and a 24.97% lower differential resistance (37.32 Ω), and the thermal rollover current is delayed to 6.07 mA than conventional design. When the injection current is 20 mA, the BTJ-type VCSEL exhibits a low temperature and Auger recombination rate, while the stimulated recombination rate is high. In addition, the BTJ-type VCSEL shows a small far-field divergence angle and good beam quality. Therefore, the designed BTJ-type VCSEL offers valuable guidance for the preparation of high-reliability and long-lifetime VCSEL.http://dx.doi.org/10.1063/5.0267467
spellingShingle Linjin Song
Zhigang Jia
Wei Jia
Shufang Ma
Lin Shang
Hailiang Dong
A buried tunnel junction 940 nm VCSEL for achieving thermal diffusion characteristics
AIP Advances
title A buried tunnel junction 940 nm VCSEL for achieving thermal diffusion characteristics
title_full A buried tunnel junction 940 nm VCSEL for achieving thermal diffusion characteristics
title_fullStr A buried tunnel junction 940 nm VCSEL for achieving thermal diffusion characteristics
title_full_unstemmed A buried tunnel junction 940 nm VCSEL for achieving thermal diffusion characteristics
title_short A buried tunnel junction 940 nm VCSEL for achieving thermal diffusion characteristics
title_sort buried tunnel junction 940 nm vcsel for achieving thermal diffusion characteristics
url http://dx.doi.org/10.1063/5.0267467
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