Optimization of CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> Heterojunction Diodes for High-Voltage Power Electronics

This study optimizes the CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> heterojunction diodes (HJDs) by tailoring the structural parameters of CuO<sub>x</sub> layers. The hole concentration in the sputtered CuO<sub>x</sub> was precisely contro...

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Main Authors: Xiaohui Wang, Mujun Li, Minghao He, Honghao Lu, Chun-Zhang Chen, Yang Jiang, Kangyao Wen, Fangzhou Du, Yi Zhang, Chenkai Deng, Zilong Xiong, Haozhe Yu, Qing Wang, Hongyu Yu
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Language:English
Published: MDPI AG 2025-01-01
Series:Nanomaterials
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Online Access:https://www.mdpi.com/2079-4991/15/2/87
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author Xiaohui Wang
Mujun Li
Minghao He
Honghao Lu
Chun-Zhang Chen
Yang Jiang
Kangyao Wen
Fangzhou Du
Yi Zhang
Chenkai Deng
Zilong Xiong
Haozhe Yu
Qing Wang
Hongyu Yu
author_facet Xiaohui Wang
Mujun Li
Minghao He
Honghao Lu
Chun-Zhang Chen
Yang Jiang
Kangyao Wen
Fangzhou Du
Yi Zhang
Chenkai Deng
Zilong Xiong
Haozhe Yu
Qing Wang
Hongyu Yu
author_sort Xiaohui Wang
collection DOAJ
description This study optimizes the CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> heterojunction diodes (HJDs) by tailoring the structural parameters of CuO<sub>x</sub> layers. The hole concentration in the sputtered CuO<sub>x</sub> was precisely controlled by adjusting the Ar/O<sub>2</sub> gas ratio. Experimental investigations and TCAD simulations were employed to systematically evaluate the impact of the CuO<sub>x</sub> layer dimension and hole concentration on the electrical performance of HJDs. The results indicate that increasing the diameter dimension of the CuO<sub>x</sub> layer or tuning the hole concentration to optimal values significantly enhances the breakdown voltage (V<sub>B</sub>) of single-layer HJDs by mitigating the electric field crowing effects. Additionally, a double-layer CuO<sub>x</sub> structure (p<sup>+</sup> CuO<sub>x</sub>/p<sup>−</sup> CuO<sub>x</sub>) was designed and optimized to achieve an ideal balance between the V<sub>B</sub> and specific on-resistance (R<sub>on,sp</sub>). This double-layer HJD demonstrated a high V<sub>B</sub> of 2780 V and a low R<sub>on,sp</sub> of 6.46 mΩ·cm<sup>2</sup>, further yielding a power figure of merit of 1.2 GW/cm<sup>2</sup>. These findings present a promising strategy for advancing the performance of Ga<sub>2</sub>O<sub>3</sub> devices in power electronics applications.
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publishDate 2025-01-01
publisher MDPI AG
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series Nanomaterials
spelling doaj-art-876fe2ee5b884463a6ea7a5ef7ac2a052025-01-24T13:44:05ZengMDPI AGNanomaterials2079-49912025-01-011528710.3390/nano15020087Optimization of CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> Heterojunction Diodes for High-Voltage Power ElectronicsXiaohui Wang0Mujun Li1Minghao He2Honghao Lu3Chun-Zhang Chen4Yang Jiang5Kangyao Wen6Fangzhou Du7Yi Zhang8Chenkai Deng9Zilong Xiong10Haozhe Yu11Qing Wang12Hongyu Yu13School of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaPeng Cheng Laboratory, Shenzhen 518000, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaSchool of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, ChinaThis study optimizes the CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> heterojunction diodes (HJDs) by tailoring the structural parameters of CuO<sub>x</sub> layers. The hole concentration in the sputtered CuO<sub>x</sub> was precisely controlled by adjusting the Ar/O<sub>2</sub> gas ratio. Experimental investigations and TCAD simulations were employed to systematically evaluate the impact of the CuO<sub>x</sub> layer dimension and hole concentration on the electrical performance of HJDs. The results indicate that increasing the diameter dimension of the CuO<sub>x</sub> layer or tuning the hole concentration to optimal values significantly enhances the breakdown voltage (V<sub>B</sub>) of single-layer HJDs by mitigating the electric field crowing effects. Additionally, a double-layer CuO<sub>x</sub> structure (p<sup>+</sup> CuO<sub>x</sub>/p<sup>−</sup> CuO<sub>x</sub>) was designed and optimized to achieve an ideal balance between the V<sub>B</sub> and specific on-resistance (R<sub>on,sp</sub>). This double-layer HJD demonstrated a high V<sub>B</sub> of 2780 V and a low R<sub>on,sp</sub> of 6.46 mΩ·cm<sup>2</sup>, further yielding a power figure of merit of 1.2 GW/cm<sup>2</sup>. These findings present a promising strategy for advancing the performance of Ga<sub>2</sub>O<sub>3</sub> devices in power electronics applications.https://www.mdpi.com/2079-4991/15/2/87power electronicsβ-Ga<sub>2</sub>O<sub>3</sub>heterojunction diodesCu<sub>2</sub>Ooptimization
spellingShingle Xiaohui Wang
Mujun Li
Minghao He
Honghao Lu
Chun-Zhang Chen
Yang Jiang
Kangyao Wen
Fangzhou Du
Yi Zhang
Chenkai Deng
Zilong Xiong
Haozhe Yu
Qing Wang
Hongyu Yu
Optimization of CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> Heterojunction Diodes for High-Voltage Power Electronics
Nanomaterials
power electronics
β-Ga<sub>2</sub>O<sub>3</sub>
heterojunction diodes
Cu<sub>2</sub>O
optimization
title Optimization of CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> Heterojunction Diodes for High-Voltage Power Electronics
title_full Optimization of CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> Heterojunction Diodes for High-Voltage Power Electronics
title_fullStr Optimization of CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> Heterojunction Diodes for High-Voltage Power Electronics
title_full_unstemmed Optimization of CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> Heterojunction Diodes for High-Voltage Power Electronics
title_short Optimization of CuO<sub>x</sub>/Ga<sub>2</sub>O<sub>3</sub> Heterojunction Diodes for High-Voltage Power Electronics
title_sort optimization of cuo sub x sub ga sub 2 sub o sub 3 sub heterojunction diodes for high voltage power electronics
topic power electronics
β-Ga<sub>2</sub>O<sub>3</sub>
heterojunction diodes
Cu<sub>2</sub>O
optimization
url https://www.mdpi.com/2079-4991/15/2/87
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