Method for forming a titanium-germanium contact layer for thermostabilization of transistors
Objective. The objective of the study is to obtain high-quality and reproducible electrophysical parameters of thin-film metal layers, the formation technology of which determines the reliability and quality of microelectronic products – silicon transistors.Methods. A method for forming a two-layer...
Saved in:
| Main Authors: | T. A. Ismailov, A. R. Shakhmayeva, Sh. A. Yusufov, E. Kazalieva |
|---|---|
| Format: | Article |
| Language: | Russian |
| Published: |
Dagestan State Technical University
2021-01-01
|
| Series: | Вестник Дагестанского государственного технического университета: Технические науки |
| Subjects: | |
| Online Access: | https://vestnik.dgtu.ru/jour/article/view/876 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Improving the thermal properties of the device in the process of forming a contact with the collector region of a silicon transistor
by: E. Kazalieva, et al.
Published: (2022-11-01) -
Preparation of high purity germanium single crystal and analysis of dislocation density
by: HAO Xin, et al.
Published: (2022-09-01) -
Improving Performance of Germanium-Based Vertical Tunneling Field Effect Transistor Using GaAs as Channel
by: Shoaib Babaei tooski, et al.
Published: (2024-04-01) -
Modulating contact properties by molecular layers in organic thin‐film transistors
by: Li Sun, et al.
Published: (2023-11-01) -
Surface Passivation of Germanium Using NH3 Ambient in RTP for High Mobility MOS Structure
by: Anil G. Khairnar, et al.
Published: (2013-05-01)