Capacitance of Film Structures Including Graphitic Carbon Nitride

Capacitance of Film Structures Including Graphitic Carbon Nitride

Al/g-C3N4/Si/Al, Al/g-C3N4/SiO2/Si/Al, Al/g-C3N4/Al and Al/g-C3N4/Al2O3/Al structures were fabricated by rapid chemical vapor deposition of graphitic carbon nitride (g-C3N4) from melamine onto silicon (Si) and aluminum (Al) substrates partially coated with appropriate oxide – SiO2 or Al2O3 – and Al...

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Bibliographic Details
Main Authors: V. T. Pham, S. E. Maximov, E. A. Utkina, E. B. Chubenko, V. E. Borisenko
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2024-12-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
Subjects:
film
carbon nitride
aluminium oxide
silicon oxide
capacitance
Online Access:https://doklady.bsuir.by/jour/article/view/4017
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