Omura, Y. Feasible Time Evolution Model That Predicts Breakdown in Thin SiO2 Films within Unstressed Interval after Constant-Current Stress. Wiley.
Chicago Style (17th ed.) CitationOmura, Yasuhisa. Feasible Time Evolution Model That Predicts Breakdown in Thin SiO2 Films Within Unstressed Interval After Constant-Current Stress. Wiley.
MLA (9th ed.) CitationOmura, Yasuhisa. Feasible Time Evolution Model That Predicts Breakdown in Thin SiO2 Films Within Unstressed Interval After Constant-Current Stress. Wiley.
Warning: These citations may not always be 100% accurate.