Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current Electrodeposition
[Fe (tFe) nm/Cu (tCu) nm]N multilayer films were prepared using pulsed-current electrodeposition method. The role of the pulsed-current deposition and Fe and Cu layer thicknesses on the magnetic properties was investigated. The microstructure of the multilayer films is dependent on the thicknesses o...
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| Format: | Article |
| Language: | English |
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Sumy State University
2012-03-01
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| Series: | Журнал нано- та електронної фізики |
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| Online Access: | http://jnep.sumdu.edu.ua/download/numbers/2012/1/articles/jnep_2012_V4_01001.pdf |
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| author | B.R. Karki Y. Ueda C. Rizal |
| author_facet | B.R. Karki Y. Ueda C. Rizal |
| author_sort | B.R. Karki |
| collection | DOAJ |
| description | [Fe (tFe) nm/Cu (tCu) nm]N multilayer films were prepared using pulsed-current electrodeposition method. The role of the pulsed-current deposition and Fe and Cu layer thicknesses on the magnetic properties was investigated. The microstructure of the multilayer films is dependent on the thicknesses of both the Fe and Cu layers. The saturation magnetization of the multilayers strongly correlated with the crystalline structure of Fe at the interface of Fe and Cu layers. <br> [Fe (tFe) nm/Cu (tCu) nm]N multilayer films were prepared using pulsed-current electrodeposition method. The role of the pulsed-current deposition and Fe and Cu layer thicknesses on the magnetic properties was investigated. The microstructure of the multilayer films is dependent on the thicknesses of both the Fe and Cu layers. The saturation magnetization of the multilayers strongly correlated with the crystalline structure of Fe at the interface of Fe and Cu layers. <br> [Fe (tFe) nm/Cu (tCu) nm]N multilayer films were prepared using pulsed-current electrodeposition method. The role of the pulsed-current deposition and Fe and Cu layer thicknesses on the magnetic properties was investigated. The microstructure of the multilayer films is dependent on the thicknesses of both the Fe and Cu layers. The saturation magnetization of the multilayers strongly correlated with the crystalline structure of Fe at the interface of Fe and Cu layers. |
| format | Article |
| id | doaj-art-7ec9252c8c114c2ca6fe70a9f586f388 |
| institution | OA Journals |
| issn | 2077-6772 |
| language | English |
| publishDate | 2012-03-01 |
| publisher | Sumy State University |
| record_format | Article |
| series | Журнал нано- та електронної фізики |
| spelling | doaj-art-7ec9252c8c114c2ca6fe70a9f586f3882025-08-20T01:57:55ZengSumy State UniversityЖурнал нано- та електронної фізики2077-67722012-03-0141010011Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current ElectrodepositionB.R. KarkiY. UedaC. Rizal[Fe (tFe) nm/Cu (tCu) nm]N multilayer films were prepared using pulsed-current electrodeposition method. The role of the pulsed-current deposition and Fe and Cu layer thicknesses on the magnetic properties was investigated. The microstructure of the multilayer films is dependent on the thicknesses of both the Fe and Cu layers. The saturation magnetization of the multilayers strongly correlated with the crystalline structure of Fe at the interface of Fe and Cu layers. <br> [Fe (tFe) nm/Cu (tCu) nm]N multilayer films were prepared using pulsed-current electrodeposition method. The role of the pulsed-current deposition and Fe and Cu layer thicknesses on the magnetic properties was investigated. The microstructure of the multilayer films is dependent on the thicknesses of both the Fe and Cu layers. The saturation magnetization of the multilayers strongly correlated with the crystalline structure of Fe at the interface of Fe and Cu layers. <br> [Fe (tFe) nm/Cu (tCu) nm]N multilayer films were prepared using pulsed-current electrodeposition method. The role of the pulsed-current deposition and Fe and Cu layer thicknesses on the magnetic properties was investigated. The microstructure of the multilayer films is dependent on the thicknesses of both the Fe and Cu layers. The saturation magnetization of the multilayers strongly correlated with the crystalline structure of Fe at the interface of Fe and Cu layers.http://jnep.sumdu.edu.ua/download/numbers/2012/1/articles/jnep_2012_V4_01001.pdfPulsed-current depositionFe/CuMultilayersSaturation magnetizationMicrostructurPulsed-current depositionFe/CuMultilayersSaturation magnetizationMicrostructurPulsed-current depositionFe/CuMultilayersSaturation magnetizationMicrostructur |
| spellingShingle | B.R. Karki Y. Ueda C. Rizal Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current Electrodeposition Журнал нано- та електронної фізики Pulsed-current deposition Fe/Cu Multilayers Saturation magnetization Microstructur Pulsed-current deposition Fe/Cu Multilayers Saturation magnetization Microstructur Pulsed-current deposition Fe/Cu Multilayers Saturation magnetization Microstructur |
| title | Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current Electrodeposition |
| title_full | Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current Electrodeposition |
| title_fullStr | Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current Electrodeposition |
| title_full_unstemmed | Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current Electrodeposition |
| title_short | Magnetic Properties of Fe/Cu Multilayers Prepared Using Pulsed-Current Electrodeposition |
| title_sort | magnetic properties of fe cu multilayers prepared using pulsed current electrodeposition |
| topic | Pulsed-current deposition Fe/Cu Multilayers Saturation magnetization Microstructur Pulsed-current deposition Fe/Cu Multilayers Saturation magnetization Microstructur Pulsed-current deposition Fe/Cu Multilayers Saturation magnetization Microstructur |
| url | http://jnep.sumdu.edu.ua/download/numbers/2012/1/articles/jnep_2012_V4_01001.pdf |
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