Pilot study on treatment and near zero discharge of gallium arsenide wafer processing wastewater
In the process of gallium arsenide wafer, a large number of toxic and harmful organic wastewater with arsenic was produced. In this paper, the process of “arsenic removal pretreatment+biochemical treatment+advanced treatment” was used to achieve the standard treatment of gallium arsenide wafer proce...
Saved in:
| Main Authors: | LI Weichao, YANG Jun, CHANG Hai, GENG Tianchi, WU Yuchong, LIU Jingjing, WANG Yuyu, WU Yun, CHEN Yingbo |
|---|---|
| Format: | Article |
| Language: | zho |
| Published: |
Editorial Office of Industrial Water Treatment
2025-03-01
|
| Series: | Gongye shui chuli |
| Subjects: | |
| Online Access: | https://www.iwt.cn/CN/rich_html/10.19965/j.cnki.iwt.2024-0123 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Investigation of the process of reactive ion-beam sputtering of gallium arsenide using optical emission spectroscopy
by: E. V. Тelesh
Published: (2021-02-01) -
Effective thickness of gallium arsenide on the transverse electric and transverse magnetic modes
by: Alwan Saib Thiab, et al.
Published: (2025-07-01) -
THREE DIMENsION MODELLING OF OUTPUT CHARACTERISTICS OF GALLIUM ARSENIDE TRANSISTORS with submicron length of the gate
by: V. N. Mishchenka
Published: (2019-06-01) -
On-Orbit Life Prediction and Analysis of Triple-Junction Gallium Arsenide Solar Arrays for MEO Satellites
by: Huan Liu, et al.
Published: (2025-07-01) -
Strategic Review of Arsenide, Phosphide and Nitride MOSFETs
by: Gourab Dutta, et al.
Published: (2011-01-01)