Properties of Nickel Films Prepared by R.F. Sputtering and Interdiffusion Analysis of Ta2N–Ni Films

Properties of Nickel Films Prepared by R.F. Sputtering and Interdiffusion Analysis of Ta2N–Ni Films

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Bibliographic Details
Main Authors:	G. Morillot, A. Huber, S. Abdin, C. Val
Format:	Article
Language:	English
Published:	Wiley 1980-01-01
Series:	Active and Passive Electronic Components
Online Access:	http://dx.doi.org/10.1155/APEC.7.159
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