Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering
Carbon and boron nitride nanoperiod (C/BN)n, boron nitride and carbon (BN/C)n, carbon nitride and boron nitride nanoperiod (CN/BN)n, and boron nitride and carbon nitride (BN/CN)n ]multilayer films with a 4-nm-period multilayer structure were deposited by bias radio frequency (RF) sputtering. The sub...
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| Format: | Article |
| Language: | English |
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Wiley
2012-01-01
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| Series: | Journal of Nanotechnology |
| Online Access: | http://dx.doi.org/10.1155/2012/561250 |
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| author | Shojiro Miyake Mei Wang |
| author_facet | Shojiro Miyake Mei Wang |
| author_sort | Shojiro Miyake |
| collection | DOAJ |
| description | Carbon and boron nitride nanoperiod (C/BN)n, boron nitride and carbon (BN/C)n, carbon nitride and boron nitride nanoperiod (CN/BN)n, and boron nitride and carbon nitride (BN/CN)n ]multilayer films with a 4-nm-period multilayer structure were deposited by bias radio frequency (RF) sputtering. The substrate used for deposition was repeatedly positioned opposite graphite and boron nitride targets. Both the nanoindentation hardness and microwear resistance of the multilayer (CN/BN)n and (BN/CN)n films changed with the layer period. The multilayer films with a 4 nm period had the highest hardness and microwear resistance. The processing characteristics of the (C/BN)n and (BN/C)n films with a 4-nm-period multilayer structure were investigated using a conductive atomic force microscope (AFM) with force modulation, which permits the quantitative recording of current and frictional force as functions of applied force. The results of processing indicated that friction and surface-current measurements are effective methods of investigating multilayer nanostructural surfaces and that the method proposed in this study for micro-electro-mechanical processing systems has high precision. |
| format | Article |
| id | doaj-art-7daa5fcd6ea048c493983f44101f9b34 |
| institution | OA Journals |
| issn | 1687-9503 1687-9511 |
| language | English |
| publishDate | 2012-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Journal of Nanotechnology |
| spelling | doaj-art-7daa5fcd6ea048c493983f44101f9b342025-08-20T02:07:38ZengWileyJournal of Nanotechnology1687-95031687-95112012-01-01201210.1155/2012/561250561250Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias SputteringShojiro Miyake0Mei Wang1Department of Innovative System Engineering, Nippon Institute of Technology, Saitama 345-8501, JapanDepartment of Research and Development, OSG Corporation, Aichi 442-8544, JapanCarbon and boron nitride nanoperiod (C/BN)n, boron nitride and carbon (BN/C)n, carbon nitride and boron nitride nanoperiod (CN/BN)n, and boron nitride and carbon nitride (BN/CN)n ]multilayer films with a 4-nm-period multilayer structure were deposited by bias radio frequency (RF) sputtering. The substrate used for deposition was repeatedly positioned opposite graphite and boron nitride targets. Both the nanoindentation hardness and microwear resistance of the multilayer (CN/BN)n and (BN/CN)n films changed with the layer period. The multilayer films with a 4 nm period had the highest hardness and microwear resistance. The processing characteristics of the (C/BN)n and (BN/C)n films with a 4-nm-period multilayer structure were investigated using a conductive atomic force microscope (AFM) with force modulation, which permits the quantitative recording of current and frictional force as functions of applied force. The results of processing indicated that friction and surface-current measurements are effective methods of investigating multilayer nanostructural surfaces and that the method proposed in this study for micro-electro-mechanical processing systems has high precision.http://dx.doi.org/10.1155/2012/561250 |
| spellingShingle | Shojiro Miyake Mei Wang Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering Journal of Nanotechnology |
| title | Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering |
| title_full | Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering |
| title_fullStr | Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering |
| title_full_unstemmed | Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering |
| title_short | Nano- and Macrotribological Properties of Nanoperiod Multilayer Films Deposited by Bias Sputtering |
| title_sort | nano and macrotribological properties of nanoperiod multilayer films deposited by bias sputtering |
| url | http://dx.doi.org/10.1155/2012/561250 |
| work_keys_str_mv | AT shojiromiyake nanoandmacrotribologicalpropertiesofnanoperiodmultilayerfilmsdepositedbybiassputtering AT meiwang nanoandmacrotribologicalpropertiesofnanoperiodmultilayerfilmsdepositedbybiassputtering |