APA (7th ed.) Citation

Li, W., Ma, T., Tang, P., Luo, Y., Zhang, H., Zhao, J., . . . Tu, M. Nanoscale Resist‐Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography. Wiley.

Chicago Style (17th ed.) Citation

Li, Weina, Tianlei Ma, Pengyi Tang, Yunhong Luo, Hui Zhang, Jun Zhao, Rob Ameloot, and Min Tu. Nanoscale Resist‐Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography. Wiley.

MLA (9th ed.) Citation

Li, Weina, et al. Nanoscale Resist‐Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography. Wiley.