Multifunctional metamorphic III-V distributed Bragg reflectors grown on Si substrate for resonant cavity surface emitting devices

Abstract Surface-emitting optoelectronic devices such as vertical cavity surface emitting lasers are important for various applications. However, the devices are typically grown on expensive and small-size III-V substrates. Si substrates can offer much improved scalability, lower cost and higher the...

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Main Authors: Tsimafei Laryn, Rafael Jumar Chu, Yeonhwa Kim, Eunkyo Ju, Chunghyun Ahn, Hyun-Yong Yu, May Madarang, Hojoong Jung, Won Jun Choi, Daehwan Jung
Format: Article
Language:English
Published: SpringerOpen 2025-07-01
Series:PhotoniX
Online Access:https://doi.org/10.1186/s43074-025-00180-9
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_version_ 1849235091911344128
author Tsimafei Laryn
Rafael Jumar Chu
Yeonhwa Kim
Eunkyo Ju
Chunghyun Ahn
Hyun-Yong Yu
May Madarang
Hojoong Jung
Won Jun Choi
Daehwan Jung
author_facet Tsimafei Laryn
Rafael Jumar Chu
Yeonhwa Kim
Eunkyo Ju
Chunghyun Ahn
Hyun-Yong Yu
May Madarang
Hojoong Jung
Won Jun Choi
Daehwan Jung
author_sort Tsimafei Laryn
collection DOAJ
description Abstract Surface-emitting optoelectronic devices such as vertical cavity surface emitting lasers are important for various applications. However, the devices are typically grown on expensive and small-size III-V substrates. Si substrates can offer much improved scalability, lower cost and higher thermal properties but present significant challenges such as the formation of crystalline defects from the heteroepitaxial growth of III-V semiconductors on Si. Here, we propose multifunctional metamorphic In0.1Ga0.9As/AlAs distributed Bragg reflectors (DBRs) on Si which serve as a bottom mirror with a high reflectivity of 99.8% while simultaneously reducing the crystalline defect density by a factor of three, compared to GaAs/AlAs DBR on Si. The proposed DBR structure also exhibits a crack-free and exceptionally smooth surface morphology with root-mean-square roughness of 1.2 nm, which is five times smoother than the conventional GaAs/AlAs structure on Si. Furthermore, as proof of concept, InAs quantum dot surface-emitting diodes are fabricated on the metamorphic III-V DBR/Si templates and their performances are analyzed in comparison to those grown on native GaAs wafers. A narrow electroluminescence linewidth of 11.5 meV is observed, confirming that the multifunctional metamorphic DBR is promising for a scalable and more techno-economic surface-emitting III-V optoelectronics grown on Si substrates.
format Article
id doaj-art-7c4e3f52c1234ed895019290285fbf7e
institution Kabale University
issn 2662-1991
language English
publishDate 2025-07-01
publisher SpringerOpen
record_format Article
series PhotoniX
spelling doaj-art-7c4e3f52c1234ed895019290285fbf7e2025-08-20T04:02:55ZengSpringerOpenPhotoniX2662-19912025-07-016111310.1186/s43074-025-00180-9Multifunctional metamorphic III-V distributed Bragg reflectors grown on Si substrate for resonant cavity surface emitting devicesTsimafei Laryn0Rafael Jumar Chu1Yeonhwa Kim2Eunkyo Ju3Chunghyun Ahn4Hyun-Yong Yu5May Madarang6Hojoong Jung7Won Jun Choi8Daehwan Jung9Center for Quantum Technology, Korea Institute of Science and TechnologyCenter for Quantum Technology, Korea Institute of Science and TechnologyCenter for Quantum Technology, Korea Institute of Science and TechnologyCenter for Quantum Technology, Korea Institute of Science and TechnologyCenter for Quantum Technology, Korea Institute of Science and TechnologySchool of Electrical Engineering, Korea UniversityCenter for Quantum Technology, Korea Institute of Science and TechnologyCenter for Quantum Technology, Korea Institute of Science and TechnologyCenter for Quantum Technology, Korea Institute of Science and TechnologyCenter for Quantum Technology, Korea Institute of Science and TechnologyAbstract Surface-emitting optoelectronic devices such as vertical cavity surface emitting lasers are important for various applications. However, the devices are typically grown on expensive and small-size III-V substrates. Si substrates can offer much improved scalability, lower cost and higher thermal properties but present significant challenges such as the formation of crystalline defects from the heteroepitaxial growth of III-V semiconductors on Si. Here, we propose multifunctional metamorphic In0.1Ga0.9As/AlAs distributed Bragg reflectors (DBRs) on Si which serve as a bottom mirror with a high reflectivity of 99.8% while simultaneously reducing the crystalline defect density by a factor of three, compared to GaAs/AlAs DBR on Si. The proposed DBR structure also exhibits a crack-free and exceptionally smooth surface morphology with root-mean-square roughness of 1.2 nm, which is five times smoother than the conventional GaAs/AlAs structure on Si. Furthermore, as proof of concept, InAs quantum dot surface-emitting diodes are fabricated on the metamorphic III-V DBR/Si templates and their performances are analyzed in comparison to those grown on native GaAs wafers. A narrow electroluminescence linewidth of 11.5 meV is observed, confirming that the multifunctional metamorphic DBR is promising for a scalable and more techno-economic surface-emitting III-V optoelectronics grown on Si substrates.https://doi.org/10.1186/s43074-025-00180-9
spellingShingle Tsimafei Laryn
Rafael Jumar Chu
Yeonhwa Kim
Eunkyo Ju
Chunghyun Ahn
Hyun-Yong Yu
May Madarang
Hojoong Jung
Won Jun Choi
Daehwan Jung
Multifunctional metamorphic III-V distributed Bragg reflectors grown on Si substrate for resonant cavity surface emitting devices
PhotoniX
title Multifunctional metamorphic III-V distributed Bragg reflectors grown on Si substrate for resonant cavity surface emitting devices
title_full Multifunctional metamorphic III-V distributed Bragg reflectors grown on Si substrate for resonant cavity surface emitting devices
title_fullStr Multifunctional metamorphic III-V distributed Bragg reflectors grown on Si substrate for resonant cavity surface emitting devices
title_full_unstemmed Multifunctional metamorphic III-V distributed Bragg reflectors grown on Si substrate for resonant cavity surface emitting devices
title_short Multifunctional metamorphic III-V distributed Bragg reflectors grown on Si substrate for resonant cavity surface emitting devices
title_sort multifunctional metamorphic iii v distributed bragg reflectors grown on si substrate for resonant cavity surface emitting devices
url https://doi.org/10.1186/s43074-025-00180-9
work_keys_str_mv AT tsimafeilaryn multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT rafaeljumarchu multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT yeonhwakim multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT eunkyoju multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT chunghyunahn multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT hyunyongyu multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT maymadarang multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT hojoongjung multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT wonjunchoi multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices
AT daehwanjung multifunctionalmetamorphiciiivdistributedbraggreflectorsgrownonsisubstrateforresonantcavitysurfaceemittingdevices