Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition

Abstract The selective influence of elastic strain on the formation of oxygen deficiencies in (001)‐, (110)‐, and (111)‐ epitaxial Hf0.5Zr0.5O2 films grown by using atomic layer deposition is reported. Optical spectroscopy, conducted using UV–vis spectroscopic ellipsometry on these Hf0.5Zr0.5O2 film...

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Main Authors: Chihwan An, Jung Woo Cho, Tae Yoon Lee, Myeong Seop Song, Baekjune Kang, Hongju Kim, Jun Hee Lee, Changhee Sohn, Seung Chul Chae
Format: Article
Language:English
Published: Wiley-VCH 2025-04-01
Series:Advanced Materials Interfaces
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Online Access:https://doi.org/10.1002/admi.202400742
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author Chihwan An
Jung Woo Cho
Tae Yoon Lee
Myeong Seop Song
Baekjune Kang
Hongju Kim
Jun Hee Lee
Changhee Sohn
Seung Chul Chae
author_facet Chihwan An
Jung Woo Cho
Tae Yoon Lee
Myeong Seop Song
Baekjune Kang
Hongju Kim
Jun Hee Lee
Changhee Sohn
Seung Chul Chae
author_sort Chihwan An
collection DOAJ
description Abstract The selective influence of elastic strain on the formation of oxygen deficiencies in (001)‐, (110)‐, and (111)‐ epitaxial Hf0.5Zr0.5O2 films grown by using atomic layer deposition is reported. Optical spectroscopy, conducted using UV–vis spectroscopic ellipsometry on these Hf0.5Zr0.5O2 films grown on yttria‐stabilized zirconia substrates, revealed a dominant shallow trap level in the (111)‐oriented Hf0.5Zr0.5O2 film. X‐ray photoemission spectroscopy demonstrated that the strong oxygen deficiency is preferred in the (111)‐oriented Hf0.5Zr0.5O2 film. Density functional theory calculations of oxygen vacancy formation energy also showed a pronounced preference for oxygen deficiencies in the (111) orientation. This selective formation of oxygen vacancies in the (111)‐oriented Hf0.5Zr0.5O2 film suggests that the latent phenomena associated with oxygen defects in functional Hf0.5Zr0.5O2 films are partly attributed to the directional strain in the (111) orientation.
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id doaj-art-7be3d9b80d1e4416b7236d2ca461d10b
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issn 2196-7350
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publishDate 2025-04-01
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series Advanced Materials Interfaces
spelling doaj-art-7be3d9b80d1e4416b7236d2ca461d10b2025-08-20T02:27:18ZengWiley-VCHAdvanced Materials Interfaces2196-73502025-04-01128n/an/a10.1002/admi.202400742Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer DepositionChihwan An0Jung Woo Cho1Tae Yoon Lee2Myeong Seop Song3Baekjune Kang4Hongju Kim5Jun Hee Lee6Changhee Sohn7Seung Chul Chae8Department of Physics Education Seoul National University Seoul 08826 Republic of KoreaDepartment of Physics Education Seoul National University Seoul 08826 Republic of KoreaDepartment of Physics Education Seoul National University Seoul 08826 Republic of KoreaDepartment of Physics Education Seoul National University Seoul 08826 Republic of KoreaDepartment of Physics Ulsan National Institute of Science and Technology Ulsan 44919 Republic of KoreaDepartment of Energy Engineering School of Energy and Chemical Engineering Ulsan National Institute of Science and Technology Ulsan 44919 Republic of KoreaDepartment of Energy Engineering School of Energy and Chemical Engineering Ulsan National Institute of Science and Technology Ulsan 44919 Republic of KoreaDepartment of Physics Ulsan National Institute of Science and Technology Ulsan 44919 Republic of KoreaDepartment of Physics Education Seoul National University Seoul 08826 Republic of KoreaAbstract The selective influence of elastic strain on the formation of oxygen deficiencies in (001)‐, (110)‐, and (111)‐ epitaxial Hf0.5Zr0.5O2 films grown by using atomic layer deposition is reported. Optical spectroscopy, conducted using UV–vis spectroscopic ellipsometry on these Hf0.5Zr0.5O2 films grown on yttria‐stabilized zirconia substrates, revealed a dominant shallow trap level in the (111)‐oriented Hf0.5Zr0.5O2 film. X‐ray photoemission spectroscopy demonstrated that the strong oxygen deficiency is preferred in the (111)‐oriented Hf0.5Zr0.5O2 film. Density functional theory calculations of oxygen vacancy formation energy also showed a pronounced preference for oxygen deficiencies in the (111) orientation. This selective formation of oxygen vacancies in the (111)‐oriented Hf0.5Zr0.5O2 film suggests that the latent phenomena associated with oxygen defects in functional Hf0.5Zr0.5O2 films are partly attributed to the directional strain in the (111) orientation.https://doi.org/10.1002/admi.202400742atomic layer depositionepitaxyhafnium oxideoxygen vacanciesstrain engineering
spellingShingle Chihwan An
Jung Woo Cho
Tae Yoon Lee
Myeong Seop Song
Baekjune Kang
Hongju Kim
Jun Hee Lee
Changhee Sohn
Seung Chul Chae
Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition
Advanced Materials Interfaces
atomic layer deposition
epitaxy
hafnium oxide
oxygen vacancies
strain engineering
title Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition
title_full Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition
title_fullStr Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition
title_full_unstemmed Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition
title_short Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition
title_sort geometrical anatomy for oxygen vacancies in epitaxial hf0 5zr0 5o2 films grown via atomic layer deposition
topic atomic layer deposition
epitaxy
hafnium oxide
oxygen vacancies
strain engineering
url https://doi.org/10.1002/admi.202400742
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