Polishing Ceramic Samples with Fast Argon Atoms at Different Angles of Their Incidence on the Sample Surface
Mechanical polishing of a product makes it possible to decrease the roughness of its surface to Ra = 0.001 µm by rubbing it with a fine abrasive contained in a fabric or other soft material. This method takes too much time and is associated with abrasive particles and microscopic scratches remaining...
Saved in:
| Main Authors: | Sergey N. Grigoriev, Alexander S. Metel, Marina A. Volosova, Enver S. Mustafaev, Yury A. Melnik |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2024-10-01
|
| Series: | Plasma |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2571-6182/7/4/43 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Etching Ceramic Samples with Fast Argon Atoms
by: Alexander S. Metel, et al.
Published: (2025-01-01) -
Effects of Discharge Current and Target Thickness in Dc-Magnetron Sputtering on Grain Size of Copper Deposited Samples
by: Yahya et al.
Published: (2019-03-01) -
Increasing the Wear and Corrosion Resistance of a CP-Ti Surface by Plasma Electrolytic Borocarburizing and Polishing
by: Marina A. Volosova, et al.
Published: (2024-10-01) -
Simulation of cathode surface sputtering by ions and fast atoms in Townsend discharge in argon-mercury mixture with temperature-dependent composition
by: G. G. Bondarenko, et al.
Published: (2018-09-01) -
Research Progress on Laser Polishing Mechanism and Processing Technology of Diamond Coating
by: WANG Hai-hang, MA Yu-ping, WU Xiao-long, HAN Yuan, ZHANG Xing-xing
Published: (2021-06-01)