Optical and Electrochromic Properties of E-Beam Evaporated Nickel Oxide Thin Film
Nickel oxide (NiO) thin films were deposited by e-beam evaporation on glass and ITO coated glass substrates initially held at room temperature without post-heat treatments. The structural and optical properties were investigated using glancing incident X-ray diffractometer (GIXRD) and spectrophotome...
Saved in:
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Sumy State University
2011-01-01
|
| Series: | Журнал нано- та електронної фізики |
| Subjects: | |
| Online Access: | http://jnep.sumdu.edu.ua/download/numbers/2011/1,%20Part%202/articles/jnep_2011_V3_N1(Part2)_362-369.pdf |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Summary: | Nickel oxide (NiO) thin films were deposited by e-beam evaporation on glass and ITO coated glass substrates initially held at room temperature without post-heat treatments. The structural and optical properties were investigated using glancing incident X-ray diffractometer (GIXRD) and spectrophotometer. The electrochromic (EC) behavior of NiO thin film was investigated using electrochemical technique viz. cyclic voltammetry, constant current measurement, and chronoamperometry in 1 M KOH electrolyte. The transmittance modulation and switching time with different operating voltage were also studied. |
|---|---|
| ISSN: | 2077-6772 |