Diode Physical Parameters for HEXFETs Characterization of Dose Effect

Modeling techniques of P-N junctions have been applied for studying the physical parameters in metal-oxide semiconductor field-effect transistor structures. A parameter extraction method provides a precise description of the changes in conduction processes due to radiation damages in the integral bo...

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Bibliographic Details
Main Authors: E. Bendada, K. Raïs
Format: Article
Language:English
Published: Wiley 1998-01-01
Series:Active and Passive Electronic Components
Subjects:
Online Access:http://dx.doi.org/10.1155/1998/26372
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