Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties

Transmission and reflection spectra, refraction factor of the porous silicon layers produced in HF(48%): HCl:H2O and HF(48%):HBr:H2O solutions are investigated by the sample illumination and without it. It is established that layers produced by electrolytic anodizing in HF(48%):HBr:H2O = 16:2:80 mas...

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Main Author: Е.I. Zubko
Format: Article
Language:English
Published: Sumy State University 2012-06-01
Series:Журнал нано- та електронної фізики
Subjects:
Online Access:http://jnep.sumdu.edu.ua/download/numbers/2012/2/articles/jnep_2012_V4_02036.pdf
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_version_ 1849697217503297536
author Е.I. Zubko
author_facet Е.I. Zubko
author_sort Е.I. Zubko
collection DOAJ
description Transmission and reflection spectra, refraction factor of the porous silicon layers produced in HF(48%): HCl:H2O and HF(48%):HBr:H2O solutions are investigated by the sample illumination and without it. It is established that layers produced by electrolytic anodizing in HF(48%):HBr:H2O = 16:2:80 mass% solution have the best antireflective characteristics and smaller optical transmission than other samples.
format Article
id doaj-art-6fb4bb86cb504fd2b8e0a93f70f0b29d
institution DOAJ
issn 2077-6772
language English
publishDate 2012-06-01
publisher Sumy State University
record_format Article
series Журнал нано- та електронної фізики
spelling doaj-art-6fb4bb86cb504fd2b8e0a93f70f0b29d2025-08-20T03:19:15ZengSumy State UniversityЖурнал нано- та електронної фізики2077-67722012-06-0142020361Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical PropertiesЕ.I. ZubkoTransmission and reflection spectra, refraction factor of the porous silicon layers produced in HF(48%): HCl:H2O and HF(48%):HBr:H2O solutions are investigated by the sample illumination and without it. It is established that layers produced by electrolytic anodizing in HF(48%):HBr:H2O = 16:2:80 mass% solution have the best antireflective characteristics and smaller optical transmission than other samples.http://jnep.sumdu.edu.ua/download/numbers/2012/2/articles/jnep_2012_V4_02036.pdfPorous siliconModificationPhotoanodizingReflectio
spellingShingle Е.I. Zubko
Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties
Журнал нано- та електронної фізики
Porous silicon
Modification
Photoanodizing
Reflectio
title Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties
title_full Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties
title_fullStr Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties
title_full_unstemmed Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties
title_short Formation Features of the Porous Silicon Layers Modified by НСl and HBr in the Context of Optical Properties
title_sort formation features of the porous silicon layers modified by нсl and hbr in the context of optical properties
topic Porous silicon
Modification
Photoanodizing
Reflectio
url http://jnep.sumdu.edu.ua/download/numbers/2012/2/articles/jnep_2012_V4_02036.pdf
work_keys_str_mv AT eizubko formationfeaturesoftheporoussiliconlayersmodifiedbynslandhbrinthecontextofopticalproperties