The Potential of Reactively RF Sputtered ZnO Thin Films for the Fabrication of Microwave Filters
The piezoelectric properties of reactively sputtered ZnO thin films deposited on glass and silicon substrates were studied in order to assess their potential for the construction of RF overmoded filters. Films of high crystallographic orientation {002}, as shown by XRD measurements and SEM observati...
Saved in:
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2000-01-01
|
| Series: | Active and Passive Electronic Components |
| Online Access: | http://dx.doi.org/10.1155/APEC.23.75 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| _version_ | 1850222702749548544 |
|---|---|
| author | A. T. Kollias E. D. Tsamis J. N. Avaritsiotis |
| author_facet | A. T. Kollias E. D. Tsamis J. N. Avaritsiotis |
| author_sort | A. T. Kollias |
| collection | DOAJ |
| description | The piezoelectric properties of reactively sputtered ZnO thin films deposited on glass and
silicon substrates were studied in order to assess their potential for the construction of
RF overmoded filters. Films of high crystallographic orientation {002}, as shown by
XRD measurements and SEM observations, and high value of keff2
, calculated with the aid of the BVD model, were obtained after the optimization of the deposition conditions, with highly repetitive properties. Simple devices were designed and constructed on
silicon substrates which showed a quality factor of 1000 without the use of a Bragg
acoustic reflector, and a temperature drift of –30ppm/℃. |
| format | Article |
| id | doaj-art-6f82e4719f644c13a1fffae9fda0d794 |
| institution | OA Journals |
| issn | 0882-7516 1563-5031 |
| language | English |
| publishDate | 2000-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Active and Passive Electronic Components |
| spelling | doaj-art-6f82e4719f644c13a1fffae9fda0d7942025-08-20T02:06:15ZengWileyActive and Passive Electronic Components0882-75161563-50312000-01-01232759510.1155/APEC.23.75The Potential of Reactively RF Sputtered ZnO Thin Films for the Fabrication of Microwave FiltersA. T. Kollias0E. D. Tsamis1J. N. Avaritsiotis2Department of Electrical and Computer Engineering, National Technical University of Athens, 9, lroon Polytechniou St. Zografou, Athens 15773, GreeceDepartment of Electrical and Computer Engineering, National Technical University of Athens, 9, lroon Polytechniou St. Zografou, Athens 15773, GreeceDepartment of Electrical and Computer Engineering, National Technical University of Athens, 9, lroon Polytechniou St. Zografou, Athens 15773, GreeceThe piezoelectric properties of reactively sputtered ZnO thin films deposited on glass and silicon substrates were studied in order to assess their potential for the construction of RF overmoded filters. Films of high crystallographic orientation {002}, as shown by XRD measurements and SEM observations, and high value of keff2 , calculated with the aid of the BVD model, were obtained after the optimization of the deposition conditions, with highly repetitive properties. Simple devices were designed and constructed on silicon substrates which showed a quality factor of 1000 without the use of a Bragg acoustic reflector, and a temperature drift of –30ppm/℃.http://dx.doi.org/10.1155/APEC.23.75 |
| spellingShingle | A. T. Kollias E. D. Tsamis J. N. Avaritsiotis The Potential of Reactively RF Sputtered ZnO Thin Films for the Fabrication of Microwave Filters Active and Passive Electronic Components |
| title | The Potential of Reactively RF Sputtered ZnO Thin Films for the Fabrication
of Microwave Filters |
| title_full | The Potential of Reactively RF Sputtered ZnO Thin Films for the Fabrication
of Microwave Filters |
| title_fullStr | The Potential of Reactively RF Sputtered ZnO Thin Films for the Fabrication
of Microwave Filters |
| title_full_unstemmed | The Potential of Reactively RF Sputtered ZnO Thin Films for the Fabrication
of Microwave Filters |
| title_short | The Potential of Reactively RF Sputtered ZnO Thin Films for the Fabrication
of Microwave Filters |
| title_sort | potential of reactively rf sputtered zno thin films for the fabrication of microwave filters |
| url | http://dx.doi.org/10.1155/APEC.23.75 |
| work_keys_str_mv | AT atkollias thepotentialofreactivelyrfsputteredznothinfilmsforthefabricationofmicrowavefilters AT edtsamis thepotentialofreactivelyrfsputteredznothinfilmsforthefabricationofmicrowavefilters AT jnavaritsiotis thepotentialofreactivelyrfsputteredznothinfilmsforthefabricationofmicrowavefilters AT atkollias potentialofreactivelyrfsputteredznothinfilmsforthefabricationofmicrowavefilters AT edtsamis potentialofreactivelyrfsputteredznothinfilmsforthefabricationofmicrowavefilters AT jnavaritsiotis potentialofreactivelyrfsputteredznothinfilmsforthefabricationofmicrowavefilters |