Stronger femtosecond excitation causes slower electron-phonon coupling in silicon

Electron-hole pairs in semiconductors are essential for solar cells and fast electronic circuitry, but the competition between carrier transport and relaxation into heat limits the efficiency and speed. Here we use ultrafast electron diffraction with terahertz pulse compression to measure the electr...

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Main Authors: A. B. Swain, J. Kuttruff, J. Vorberger, P. Baum
Format: Article
Language:English
Published: American Physical Society 2025-05-01
Series:Physical Review Research
Online Access:http://doi.org/10.1103/PhysRevResearch.7.023114
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author A. B. Swain
J. Kuttruff
J. Vorberger
P. Baum
author_facet A. B. Swain
J. Kuttruff
J. Vorberger
P. Baum
author_sort A. B. Swain
collection DOAJ
description Electron-hole pairs in semiconductors are essential for solar cells and fast electronic circuitry, but the competition between carrier transport and relaxation into heat limits the efficiency and speed. Here we use ultrafast electron diffraction with terahertz pulse compression to measure the electron-phonon decay rate in single-crystal silicon as a function of laser excitation strength. We find that the excited electrons relax slower into phonons for higher carrier densities. The electron-phonon scattering rate changes in a nonlinear way from 400 fs at ∼2×10^{20}/cm^{3} to 1.2 ps at ∼4×10^{20}/cm^{3}. These results indicate that a hot electron gas quenches the scattering into phonons in a temperature-dependent way. Ultrafast electronic circuitry of silicon should therefore work faster and provide higher bandwidths at lower carrier densities.
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series Physical Review Research
spelling doaj-art-6a6494eebf0b42fb8b8872db8e98e5352025-08-20T03:48:42ZengAmerican Physical SocietyPhysical Review Research2643-15642025-05-017202311410.1103/PhysRevResearch.7.023114Stronger femtosecond excitation causes slower electron-phonon coupling in siliconA. B. SwainJ. KuttruffJ. VorbergerP. BaumElectron-hole pairs in semiconductors are essential for solar cells and fast electronic circuitry, but the competition between carrier transport and relaxation into heat limits the efficiency and speed. Here we use ultrafast electron diffraction with terahertz pulse compression to measure the electron-phonon decay rate in single-crystal silicon as a function of laser excitation strength. We find that the excited electrons relax slower into phonons for higher carrier densities. The electron-phonon scattering rate changes in a nonlinear way from 400 fs at ∼2×10^{20}/cm^{3} to 1.2 ps at ∼4×10^{20}/cm^{3}. These results indicate that a hot electron gas quenches the scattering into phonons in a temperature-dependent way. Ultrafast electronic circuitry of silicon should therefore work faster and provide higher bandwidths at lower carrier densities.http://doi.org/10.1103/PhysRevResearch.7.023114
spellingShingle A. B. Swain
J. Kuttruff
J. Vorberger
P. Baum
Stronger femtosecond excitation causes slower electron-phonon coupling in silicon
Physical Review Research
title Stronger femtosecond excitation causes slower electron-phonon coupling in silicon
title_full Stronger femtosecond excitation causes slower electron-phonon coupling in silicon
title_fullStr Stronger femtosecond excitation causes slower electron-phonon coupling in silicon
title_full_unstemmed Stronger femtosecond excitation causes slower electron-phonon coupling in silicon
title_short Stronger femtosecond excitation causes slower electron-phonon coupling in silicon
title_sort stronger femtosecond excitation causes slower electron phonon coupling in silicon
url http://doi.org/10.1103/PhysRevResearch.7.023114
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