APA (7th ed.) Citation

Novkovski, N., Paskaleva, A., Skeparovski, A., & Spassov, D. Analysis of Conduction and Charging Mechanisms in Atomic Layer Deposited Multilayered HfO2/Al2O3 Stacks for Use in Charge Trapping Flash Memories. Wiley.

Chicago Style (17th ed.) Citation

Novkovski, Nenad, Albena Paskaleva, Aleksandar Skeparovski, and Dencho Spassov. Analysis of Conduction and Charging Mechanisms in Atomic Layer Deposited Multilayered HfO2/Al2O3 Stacks for Use in Charge Trapping Flash Memories. Wiley.

MLA (9th ed.) Citation

Novkovski, Nenad, et al. Analysis of Conduction and Charging Mechanisms in Atomic Layer Deposited Multilayered HfO2/Al2O3 Stacks for Use in Charge Trapping Flash Memories. Wiley.